Aligner/Direct Write Semiconductor Lithography Equipment

The Glenn Research Center’s Smart Sensing and Electronic Systems Branch is seeking a new lithographic system to enhance its capability in developing wide band gap electronics and sensors designed for harsh environments. This equipment will support advanced fabrication processes critical to NASA’s mission in next-generation sensors and electronic systems, enabling innovations in extreme condition performance and reliability. The procurement is forecasted under the NAICS code 333242, indicating it is related to semiconductor device manufacturing equipment, and is intended to augment existing capabilities within the center’s microfabrication infrastructure. The solicitation is posted as a forecast with no specific solicitation number or set-aside designation, suggesting it is in the early planning stage for future acquisition. The place of performance and point of contact details are not yet defined, but the equipment is expected to be deployed at the Glenn Research Center. The alignment and direct write lithography system will be essential for precise patterning at micro and nanoscales, supporting research into devices that operate under high temperature, radiation, and mechanical stress conditions. The timeline indicates the forecast was published in May 2026, signaling a near-term intent to move forward with procurement activities once requirements are finalized and funding is secured.