Atomic Layer Deposition (ALD) Reactor System
Contract Overview
Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.
AI Contract Overview
The Naval Research Laboratory under the Department of Defense is seeking quotations for an atomic layer deposition reactor system under solicitation number N00173-26-Q-TB02. The required equipment must support the uniform and conformal deposition of oxide, nitride, and metal films using both traditional thermal and plasma enhanced modes, specifically designed for substrates with high aspect ratio surface topographies. This acquisition is a total set-aside for small business concerns and is assigned a DPAS rating of DO-C9. Interested parties must submit their offers by the deadline of September 14, 2026. The place of performance for this contract is located in Washington, DC.
General Info
Agency
NAICS
Place of Performance
Washington, DC, USASet-Aside
Documents
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Full Description
COMBINED SYNOPSIS / SOLICITATION FOR COMMERCIAL ITEMS
This is a combined synopsis/solicitation for commercial products or commercial services prepared in accordance with part 12. This announcement constitutes the only solicitation. Offers are being requested and a separate written solicitation will not be issued.
Solicitation number N00173-26-Q-TB02 is issued as a request for quotation (RFQ) for an atomic layer deposition (ALD) reactor for the uniform and conformal deposition of oxide, nitride, and metal films with atomic-layer precision onto substrates of high aspect ratio surface topographies using both traditional thermal atomic layer deposition (ALD) and plasma enhanced ALD (PE-ALD) modes.
This acquisition is set-aside for small business concerns. This solicitation incorporates provisions and clauses by reference. The full text of provisions and clauses may be accessed electronically at www.acquisition.gov.
The Defense Priorities and Allocations System (DPAS) and assigned rating are DO-C9.
See solicitation attachment, below.
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