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Atomic Layer Deposition (ALD) Reactor System

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N00173-26-Q-TB02Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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The Naval Research Laboratory under the Department of Defense is seeking quotations for an atomic layer deposition reactor system under solicitation number N00173-26-Q-TB02. The required equipment must support the uniform and conformal deposition of oxide, nitride, and metal films using both traditional thermal and plasma enhanced modes, specifically designed for substrates with high aspect ratio surface topographies. This acquisition is a total set-aside for small business concerns and is assigned a DPAS rating of DO-C9. Interested parties must submit their offers by the deadline of September 14, 2026. The place of performance for this contract is located in Washington, DC.

General Info

NRL seeks small business quotes for an atomic layer deposition reactor by September 2026.

Agency

Department Of Defense → Naval Research LaboratoryView Agency

NAICS

334513 - Instruments and Related Products Manufacturing for Measuring, Displaying, and Controlling Industrial Process VariablesView NAICS

Place of Performance

Washington, DC, USA

Set-Aside

SBA

Documents

(2)

N00173-26-Q-TB02+FOR+ALD+SYSTEM+-+Posted+01+Sept+2026.pdf

PDF

ALD+Specifications.pdf

PDF

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Timeline

PhaseCombined Synopsis
Posted

Combined Synopsis

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Organization & Contact Information

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AgencyDepartment Of Defense → Naval Research Laboratory
Contacts2 people available
OfficeWASHINGTON, DC, 20375-5328, USA
Organization / Agency
Department Of Defense → Naval Research Laboratory
View Agency Profile
Office AddressWASHINGTON, DC, 20375-5328, USA
Contacts

Full Description

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COMBINED SYNOPSIS / SOLICITATION FOR COMMERCIAL ITEMS


This is a combined synopsis/solicitation for commercial products or commercial services prepared in accordance with part 12. This announcement constitutes the only solicitation. Offers are being requested and a separate written solicitation will not be issued.


Solicitation number N00173-26-Q-TB02 is issued as a  request for quotation (RFQ) for an atomic layer deposition (ALD) reactor for the uniform and conformal deposition of oxide, nitride, and metal films with atomic-layer precision onto substrates of high aspect ratio surface topographies using both traditional thermal atomic layer deposition (ALD) and plasma enhanced ALD (PE-ALD) modes.


This acquisition is set-aside for small business concerns. This solicitation incorporates provisions and clauses by reference. The full text of provisions and clauses may be accessed electronically at www.acquisition.gov.


The Defense Priorities and Allocations System (DPAS) and assigned rating are DO-C9.


See solicitation attachment, below.


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