This Solicitation opportunity from National Aeronautics And Space Administration was posted on May 1, 2024. The submission period has ended. Browse the details below for market research, or find similar active opportunities.
Deep Reactive Ion Etching of Single Crystal 4H-SiC
Contract Overview
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Solicitation 80NSSC24867518Q, issued by the NASA Shared Services Center, is a total small business set-aside procurement under NAICS code 334519 for the deep reactive ion etching of single crystal 4H-SiC. The project requires the fabrication of three 4-inch single crystal 4H-SiC wafers, specifically focusing on the creation of diaphragms with a thickness of 50 microns and radii ranging from 300 to 900 microns. The contractor must ensure strict adherence to requirements regarding uniformity, smoothness, and aspect ratios. The procurement process was managed by the National Aeronautics And Space Administration with a point of contact at the Stennis Space Center. The solicitation was posted on May 1, 2024, with a response deadline of May 3, 2024. The request for quotation includes detailed instructions to offerors, solicitation provisions, and necessary representations and certifications to ensure the selected vendor can meet the technical specifications of the statement of work.
General Info
Contract Value
$211,420.37Place of Performance
MS, USASet-Aside
Awardee
INTEGRATED HOLDINGS, INC.Award Issued Date
Documents
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Timeline
Submission Closed
Organization & Contact Information
Full Description
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