This Government Contract opportunity from Department Of Energy was posted on May 15, 2026. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

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Design and Engineering of ICP Etching System with ALE Capabilities

Closed

Federal

Submission Closed05/26/2026, 10:00:00 PM UTC

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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NAICS: 541330

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Facility and Operational Assessment Services

The Tulalip Tribes

POSTED

about 17 hours ago

DEADLINE

in 28 days

AI Contract Overview

The contract involves the detailed mechanical, electrical, and control system design of an advanced inductively coupled plasma (ICP) etching system equipped with atomic layer etching (ALE) capabilities. This system is intended for high-precision processing of diamond and quantum materials, highlighting its specialized application in cutting-edge material science and technology development. The work will support sophisticated manufacturing processes that require precise etching control at the atomic scale. Issued as a subcontract by the Department of Energy through Argonne National Laboratory, the contract falls under the NAICS code 541330, which relates to engineering services. The solicitation was posted in mid-May 2026, with proposals due by late May 2026, and the place of performance is designated by the zip code 60439. This contract represents a valuable opportunity for contractors specializing in complex system design within the advanced materials and semiconductor sectors.

General Info

Design advanced ICP etching system with ALE for precise diamond and quantum material processing.

Agency

Department Of Energy → Argonne National Labor - DOE ContractorView Agency

NAICS

541330 - Engineering ServicesView NAICS

Place of Performance

IL, 60439, USA

Set-Aside

NONE

Documents

This scope was carved out of 6-S176-Q-00231-00.

The full solicitation package (6 documents), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

Inductively Coupled Etching System

AI Contract Breakdown

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Timeline

PhaseClosed

PostedMay 15

subcontract

Response DeadlineMay 26

Deadline has passed

Submission Closed

05/26/2026, 10:00:00 PM UTC

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Organization & Contact Information

AgencyDepartment Of Energy → Argonne National Labor - DOE Contractor

ContactsNo contacts available

OfficeN/A

Organization / Agency

Department Of Energy → Argonne National Labor - DOE Contractor

View Agency Profile

Office AddressN/A

ContactsNo contact information available

Full Description

Perform detailed mechanical, electrical, and control system design of an inductively coupled plasma etching system with atomic layer etching functionality for high-precision diamond and quantum material processing.