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This Government Contract opportunity from Department Of Defense was posted on September 27, 2019. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Inductively Coupled Plasma Reactive Ion Etching

Awarded
N00173-19-Q-KN03Federal

Contract Overview

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The Naval Research Laboratory, under the Department of Defense, has issued a sole-source procurement justification for an Inductively Coupled Plasma Reactive Ion Etching tool. This acquisition, identified by solicitation number N00173-19-Q-KN03, is awarded to Oxford Instruments America, Inc. with an estimated cost of 589,732.00 dollars. The procurement falls under NAICS code 333242 and is managed by contract specialists Kevin Nguyen and Kristopher J. Ramsey. The justification for this sole-source award is based on the unique capabilities of Oxford Instruments America, Inc. to meet the strict temperature and thickness requirements necessary for processing specific films produced by the Naval Research Laboratory. This procurement was conducted under FAR 13.5 to ensure the technical specifications required for the laboratory's research and development goals are met.

General Info

Contract Value

$589,732

NAICS

333242 - Semiconductor Machinery Manufacturing

Place of Performance

DC, USA

Set-Aside

NONE

Award Issued Date

Documents

1

J&A for ICP-RIE Tool - Oxford Instruments America, Inc.

PDF, Low priorityjustification-and-authorization
Low

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Timeline

PhaseAwarded
Posted

special-notice

Awarded

Contract was awarded

Submission Closed

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Organization & Contact Information

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AgencyDepartment Of Defense → Naval Research Laboratory
Contacts2 people available
OfficeWASHINGTON, DC, 20375-5328, USA
Office AddressWASHINGTON, DC, 20375-5328, USA
Contacts
Kevin NguyenCONTRACT SPECIALIST
Kristopher J. RamseyContract Specialist

Full Description

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The U.S. Department of Navy, Naval Research Laboratory (NRL) Contracting Division, proposes to enter into a sole source contract with Oxford Instruments America for the procurement of an Inductively Coupled Plasma (ICP) Reactive Ion Etcher (RIE) Tool. The Tool must be capable of dry etching a wide variety of materials including chalcogenide and silicate glasses. It must be computer controlled via menu-driven software and be user friendly. The contemplated contract type will be a Firm Fixed Price (FFP). This notice is not a request for the receipt of proposals or competitive offers. A determination by the Government to compete, or not, will be based on the responses received, and is solely within the discretion of the Government. Information received will normally be considered only for the purpose of determining whether to conduct a competitive procurement. The PSC is 3670 and the NAICS is 333242.

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