65--Atomic Force Microscope System with accesories.

Specific Requirements: The contractor shall: (1) produce an AFM with the following features: a. a system with height noise better than 30 pm b. a system that can handle samples up to 210 mm diameter and 15 mm thick c. an automated, fully software controlled, single-axis vertical engage mechanism with the sample d. top-view optics with motorized focus, digital zoon, 1.6 um resolution, and a 5 Megapixel camera for display and storage of optical image. e. a scanner with a minimum XY range of 90 um, and a minimum z range of 10 um, and the closed-loop XY noise must be less than 0.15 nm RMS. f. a system with standard scanning modes, to include: Contact Mode, Non-contact Mode, Phase Imaging, Lateral Force Microscopy (LFM), Force Spectroscopy, Force Modulation, Electric Field Microscopy (EFM), Surface Potential Microscopy also known as Kelvin Probe Force Microscopy, Magnetic Force Microscopy (MFM), ScanAsyst and Peak Force Tapping g. a system that can support optional Conductive AFM, Tunneling Atomic Force Microscopy, Scanning Thermal Microscopy, Scanning Tunneling Microscopy, Electrochemical AFM, Nanolithography/manipulation, Torsional Resonance Imaging, and Scanning Spreading Resistance Microscopy(SSRM) h. allows measurement of electrical currents in contact mode AFM, and acquisition of conductivity and topographical data is simultaneous. The controller must include data acquisition with a sampling rate up to 50MHz, and allow simultaneous collection of up to 5,000 x 5,000 pixel image for 8 channels, must provide ability to apply up to 10V bias to the AFM tip or sample, and must provide real time adjustment to all scanning parametersscan rate, scan size, scan offset, gains etc., and must support use of micro-actuated cantilevers for fast scanning (up to 10 Hz). (2) Install the instrument onsite (3) Provide enough time to train 3-4 primary users so they are comfortable with basic functions and advanced features, as listed in above.