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This Government Contract opportunity from Department Of Defense was posted on June 15, 2017. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Electron Beam Deposition System

Awarded
N00173-17-EB03Federal

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The Naval Research Laboratory, under the Department of Defense, awarded a sole-source contract to Temescal System, a division of Ferrotec USA Corporation, for the procurement of an Electron Beam Deposition System. With an estimated cost of 500,000 dollars, the system is designed to fabricate thin films of high melting temperature materials onto conducting, insulating, and semiconducting substrates under high vacuum conditions for subsequent lithographic patterning into electronic devices. To optimize efficiency and minimize contamination, the system features a dual-section vacuum chamber separated by a high vacuum isolation valve, allowing sources to remain under vacuum during substrate loading, and includes an electric hoist with a swing-out source tray for easier maintenance and reloading. The system is specifically engineered for installation within a Class 100 clean room and must be compatible with the site's strict requirements. Because it is intended for use by multiple operators, the system must be user-friendly and computer-controlled via menu-driven software, with the capability to be monitored from a location outside the clean room. This procurement was conducted as a sole-source action under 41 U.S.C. 1901 and FAR 13.5, as market research determined that Temescal System was the only provider capable of meeting all the specified technical requirements for the vacuum chamber and substrate holders.

General Info

Contract Value

$547,547

NAICS

333242 - Semiconductor Machinery Manufacturing

Place of Performance

DC, USA

Set-Aside

NONE

Award Issued Date

Documents

1

J&A for Electron Beam Deposition System - NRL

PDF, Low priorityjustification-and-authorization
Low

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Timeline

1 update
PhaseAwarded
Posted

special-notice

Notice updated

The notice description changed.

Awarded

Contract was awarded

Submission Closed

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Organization & Contact Information

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AgencyDepartment Of Defense → Naval Research Laboratory
Contacts1 person available
OfficeWASHINGTON, DC, 20375-5328, USA
Office AddressWASHINGTON, DC, 20375-5328, USA
Contacts

Full Description

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The proposed system is an Electron Beam Deposition System. NRL requires an Electron Beam Deposition System capable of fabricating thin films of high melting temperature materials onto conducting, insulating and semiconducting substrates under high vacuum conditions. These films are to be subsequently lithographically patterned into various electronic devices. In order to reduce pump down time per cycle and minimize source and substrate heater contamination, the vacuum chamber is to consist of two separate sections. An electric hoist with swing-out source tray to facilitate access of the ebeam gun for cleaning, maintenance as well as material source reloading and shield removal/cleaning. The lower source chamber is to be separated from the upper product chamber by a high vacuum isolation valve which would allow the sources to remain under vacuum during substrate loading. The system is to be installed within a Class 100 clean room, and must be compatible with the requirements of that site. It's intended for use by multiple users within that site, therefore it must be computer controlled via menu-driven software, can be monitored from a location outside the clean room, and be user friendly.

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