Thin Film Vacuum Deposition System

***NOTE: Please see attached solicitation document for full details*** THIS IS A COMBINED SYNOPSIS/SOLICITATION FOR COMMERCIAL ITEMS PREPARED IN ACCORDANCE WITH THE FORMAT IN FAR SUBPART 12.6-STREAMLINED PROCEDURES FOR EVALUATION AND SOLICITATION FOR COMMERCIAL ITEMS-AS SUPPLEMENTED WITH ADDITIONAL INFORMATION INCLUDED IN THIS NOTICE. THIS ANNOUNCEMENT CONSTITUTES THE ONLY SOLICITATION; QUOTATIONS ARE BEING REQUESTED, AND A SEPARATE WRITTEN SOLICITATION DOCUMENT WILL NOT BE ISSUED. THIS SOLICITATION IS BEING ISSUED USING SIMPLIFIED ACQUISITION PROCEDURES UNDER THE AUTHORITY OF FAR 13.5 This solicitation is a request for quotation. The solicitation document incorporated provisions and clauses are those in effect through Federal Acquisition Circular (FAC) 2005-88, effective May 16 2016. The associated North American Industrial Classification System (NAICS) code for this procurement is 333242 with a small business size of 1,500 employees. This acquisition is 100% set-aside for small business. In accordance with the non-manufacturer rule, the contractor shall be a small business under the applicable size standard and shall provide either its own product or that of another domestic small business manufacturing or processing concern. See FAR 19.102(f) for additional information. 1352.215-72 INQUIRIES (APR 2010) Offerors must submit all questions concerning this solicitation in writing to contact@example.gov. Questions should be received no later than 5 calendar days after the issuance date of this solicitation. Any responses to questions will be made in writing, without identification of the questioner, and will be included in an amendment to the solicitation. Even if provided in other form, only the question responses included in the amendment to the solicitation will govern performance of the contract. The backup point of contact is Patrick Staines at contact@example.gov. (End of Provision) All offerors shall provide a quotation for the following line item: (All equipment must be new. Used, refurbished, prototype, or remanufactured will not be considered for award). BACKGROUND: The Nanoelectronics Group advances measurement science on future electronic and optoelectronic semiconductor devices based on novel or emerging electronic materials, as well as novel and emerging electronic materials for future energy devices such as solar cells and Batteries. The group is looking to purchase a vacuum deposition system which can be integrated with an existing M-Braun Glove Box Train and used to deposit thin films (average film thicknesses of 1 nm to 500 nm) of metals, insulators, and organic materials. Using a conventional, stand-alone, vacuum thin film deposition tool for metal, organic, and inorganic thin film depositions is problematic because many materials of interest are unstable after venting the deposition chamber and exposing the thin films to room air. In addition, the power requirements (thermal budget) to deposit metals like gold, aluminum, or titanium differ significantly from those needed to deposit other materials of interest. Thus, specialized low temperature deposition (point) sources are required for the latter and proper thermal and physical isolation is necessary to prevent cross-contamination of the materials. To successfully perform high quality multi-material thin film depositions a specialized high vacuum thin film deposition system is required with a clean dry pumping system capable of achieving a system base pressure of 5X10-7 Torr or better; having multiple independently controlled deposition sources which are specifically designed for depositing the materials of interest, i.e. inorganic or organic. The base system should have three (3) thermal sources configured for metal deposition by thermal evaporation from filaments or boats, and four (4) low temperature effusion-like cell (point source) for low temperature deposition. The system must mate with an existing MBraun glove box via an existing standardized vacuum flange to allow sample transfer (linear), manipulation (rotation), and pump down prior to exposure to the deposition chamber and subsequent precisely controlled thin film deposition (average thickness and rate). Drawings or photographs of the existing glove box system and flange will be provided upon request. Such a system would permit diverse materials to be deposited sequentially or simultaneously as thin films to allow the fabrication of custom test structures for specialized measurements. This acquisition is for a Thin Film Vacuum Deposition System