This Solicitation opportunity from Department Of Energy was posted on August 23, 2026. The submission period has ended. Browse the details below for market research, or find similar active opportunities.
Gold Nanostructured Target
Contract Overview
Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.
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Solicitation 6-B139-Q-00416-00, issued by the Department of Energy's Argonne National Laboratory, seeks a domestic source for one Gold Nanostructured Target. A critical requirement of this contract is that the product must be sourced entirely from the USA, meaning both the manufacturing process and the raw materials must originate within the United States. The technical specifications call for custom gratings featuring a gold contrast material with a 5 nm chromium adhesion layer, a critical dimension of 3 micrometers, and a feature height between 20 and 250 nm. These must be produced using Ebeam and lift-off processes on a one-inch superflat silicon substrate with a micro-roughness of less than 0.5 nm rms. The procurement is categorized under NAICS code 334516 and is based in Lemont, Illinois. Bidders must comply with comprehensive federal regulations, including the ANL-70A Pre-Award Representations and Certifications and the Appendix A-71COM-22 Contract Terms and Conditions. These requirements encompass strict adherence to cybersecurity standards, counterfeit part certifications, and ethical conduct standards. Responses are due by August 26, 2026, and all contractual disputes are to be adjudicated in DuPage County, Illinois.
General Info
Place of Performance
Lemont, IL, 60439, USASet-Aside
Timeline
Submission Closed
Organization & Contact Information
Full Description
Looking for a domestic source. This means that the country of origin is the USA. Not just manfactured in the USA but also the raw materials must be from the USA.
Gold Nanostructured Target - 1 each
Description: Custom gratings
Contrast material: Au
Adhesion-layer: Cr (5 nm)
Critical dimension: 3 μm
Feature height: 20-250 nm
Substrate Specifications
Material: Superflat-Si (1 inch)
Seed-layer: None
Surface quality: Micro-roughness < 0.5 nm, rms
Process Specifications
Ebeam + Lift-off
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