This Government Contract opportunity from Department Of Defense was posted on January 16, 2013. The submission period has ended. Browse the details below for market research, or find similar active opportunities.
Inductively Couple Plasma Reactive Ion Etcher
Contract Overview
Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.
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The Air Force Nuclear Weapons Center is conducting market research to identify capable vendors for an Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System. This system must feature a hard anodized aluminum chamber and plenum, a minimum bottom electrode diameter of 200 mm, and a high conductance exhaust port. Technical requirements include an ICP unit with an RF generator of at least 600 Watts, an automatic pressure control system, a vacuum load lock, and a laser endpoint detection system. Additionally, the system requires a corrosive gas module for Cl2 and BCl3, a corrosive turbo pump, and an electrostatic chuck with helium backside cooling and temperature control ranging from 40C to 150C. This opportunity falls under NAICS code 334413 for Semiconductor and Related Device Manufacturing and FSC 6640 for Laboratory Equipment and Supplies. Interested firms must be registered in the System for Award Management and provide their company name, cage code, point of contact, and the specific manufacturer of the system they can provide. The government may consider setting this acquisition aside for the 8(a) program depending on the responses received.
General Info
Contract Value
$323,850Place of Performance
Kirtland Air Force Base, KIRTLAND AFB, NM, 87117, USASet-Aside
Awardee
TRION TECHNOLOGY INCAward Issued Date
Documents
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Timeline
Submission Closed
Organization & Contact Information
Full Description
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