NIR Semiconductor Epitaxy and Wafer Fabrication
Contract Overview
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This subcontract, titled NIR Semiconductor Epitaxy and Wafer Fabrication, involves the fabrication of semiconductor laser structures using III-V materials to support prime contractors on US Navy Office of Naval Research projects. The scope of work includes the growth of gain regions through vertical and horizontal stacking, as well as material modifications designed to minimize optical and electrical absorption. All production must be carried out using MOCVD or MBE systems within ISO Class 5 cleanrooms, with the final deliverables being processed semiconductor wafers and dies. The opportunity is designated as a Total Small Business Set-Aside under NAICS code 313210, specifically targeting firms with fewer than 500 employees in accordance with SBIR/STTR mandates. Due to the nature of the Department of Defense project, contractors are required to maintain NIST SP 800-171 compliance. The solicitation was posted on November 4, 2026, with a response deadline of December 2, 2026.
General Info
Place of Performance
Not specifiedSet-Aside
Documents
This scope was carved out of DON27TZ02-NV015.
The full solicitation package (2 documents), including the RFP, is on the prime solicitation, not on this scope.
Photonic-Crystal Surface Emitting Lasers (PCSELS) in the Near-Infrared (NIR)
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