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NIR Semiconductor Epitaxy and Wafer Fabrication

Open
SBIR / STTR

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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This subcontract, titled NIR Semiconductor Epitaxy and Wafer Fabrication, involves the fabrication of semiconductor laser structures using III-V materials to support prime contractors on US Navy Office of Naval Research projects. The scope of work includes the growth of gain regions through vertical and horizontal stacking, as well as material modifications designed to minimize optical and electrical absorption. All production must be carried out using MOCVD or MBE systems within ISO Class 5 cleanrooms, with the final deliverables being processed semiconductor wafers and dies. The opportunity is designated as a Total Small Business Set-Aside under NAICS code 313210, specifically targeting firms with fewer than 500 employees in accordance with SBIR/STTR mandates. Due to the nature of the Department of Defense project, contractors are required to maintain NIST SP 800-171 compliance. The solicitation was posted on November 4, 2026, with a response deadline of December 2, 2026.

General Info

Small business subcontract for US Navy semiconductor laser fabrication and wafer production.

Place of Performance

Not specified

Set-Aside

SBA

Documents

This scope was carved out of DON27TZ02-NV015.

The full solicitation package (2 documents), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

Photonic-Crystal Surface Emitting Lasers (PCSELS) in the Near-Infrared (NIR)

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Timeline

Posted

subcontract

Response Deadline

Submission deadline

Response Deadline

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Organization & Contact Information

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AgencyDepartment of Defense → United States Navy
ContactsNo contacts available
OfficeN/A
Office AddressN/A
ContactsNo contact information available

Full Description

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Fabricates semiconductor laser structures using III-V materials for prime contractors on US Navy Office of Naval Research projects. Performs growth of gain regions via vertical and horizontal stacking and material modification to reduce optical and electrical absorption. Utilizes MOCVD or MBE systems in ISO Class 5 cleanrooms. Requires NIST SP 800-171 compliance. Delivers processed semiconductor wafers and dies.

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W6QK Acc-Apg Natick

POSTED

7 days ago

DEADLINE

in about 2 months
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