One (1) Physical Vapor deposition/Sputtering system

(1) Action Code : SOURCES SOUGHT This is a Sources Sought Notice only. This is not a request for proposal, but a survey to locate potential sources. This Sources Sought does not constitute an Invitation for Bids, Request for Proposals, or a Request for Quotations, and is not to be construed as a commitment by the Government to issue an order or otherwise pay for the information solicited, nor is it a guarantee of a forthcoming solicitation or contract. It is for market research purposes only. Respondents will not be notified of the results of the evaluation. The purpose of this Sources Sought Notice is to gain knowledge of interest, capabilities, and qualifications of various members of industry, to include the Small Business Community: Small Business, Section 8(a), Historically Underutilized Business Zones (HUB-Zone), Service-Disabled Veteran-Owned Small Business (SDVOSB), Women-Owned Small Business (WOSB), and Economically Disadvantaged Women-Owned Small Business (EDWOSB). The Government must ensure there is adequate competition among the potential pool of responsible contractors. Small business, Section 8(a), HUBZone, SDVOSB, WOSB, & EDWOSB businesses are highly encouraged to participate. (2) Date: 7/11/2022 (3) Classification Code: 66 (4) NAICS Code: 333242 (5) NAICS Size Standard: 1,500 employees (6) Contracting Office Address: 2800 Powder Mill Road Bldg. 601 Adelphi, Maryland 20783 (7) Subject: Sources Sought for one (1) Physical Vapor deposition/Sputtering system (8) Proposed Solicitation Number: W911QX-22-R-0031 (9) Sources Sought Closing Response Date: 7/16/2022 (10) Contact Point: Abigail Conway, Contract Specialist, contact@example.gov (11) A. Objective: To find sources that are qualified to meet the supplies/services as listed in section 11B. Note that the specific requirements in section C are subject to change prior to the release of any solicitation B. Salient Characteristics: The Government requires one (1) Physical Vapor deposition/Sputtering system that shall include the following key features: Up to four (4) inch (in) (100 millimeter (mm)) max substrate capability, ability to accommodate smaller samples on a holder. Substrate holder with variable z-height Main substrate material is silicon Standard substrate temperatures used in semiconductor sputtering and physical vapor deposition growth (minimum 500 degrees Celsius (C)). Must be able to connect to a Scienta Omicron Radial Distribution Chamber (RDC) research chamber compatible with this and other process and analysis equipment. Must specify the conditions and extent to which system can achieve high vacuum and ultra high vacuum background pressure. Shall have Sputter-up configuration. The physical vapor (sputtering) system shall furthermore include these components: One (1) Ultra High or High Vacuum Sputter Deposition Physical Vapor Deposition (PVD) Chamber (ten to the negative ninth power (10-9) - ten to the negative tenth power (10-10) Torr pressure range or better) One (1) Throttle Valve and Gas Distribution One (1) Retractable Film Thickness Monitor Two (2) Magnetron Sets for three (3) inch (in) (75 millimeter) target for 300 Watt, 13.6 MegaHertz radio frequency (RF) and direct current (DC) sputtering Two (2) Magnetron Sets for three (3) inch (in) (75 millimeter) target for RF and 750 Watts DC sputtering One (1) High Power Impulse Magnetron Sputtering (HIPIMS) system with five (5) kiloWatt pulsed DC power supply Possible off-axis sputter cathodes if additional sources required or additional (two (2), but not to exceed (NTE) a total of four (4) confocal cathodes. Inert and reactive gas supply as needed Statement of gas purity (percent or grade) capability Description of the input locations relative to chamber and targets for the gas inert and reactive gas(es) being plumbed into the system. Forming gas and/or safe hydrogen (H2) gas-supply with research-grade (99.999 % purity) capability. Room for additional reactant gases as needed Mass flow controller (MFC) or throttle valve gas-flow control. Adequate soft plasma to enable ion bombardment. Potential solutions to consider for this option could include these suggestions: Hollow-cathode plasma-generation source (for example Meaglow) ICP (inductively coupled plasma) gate valve access/isolation High-flow (ten to the ninth power (109) - ten to the fourth power (104) molecules/centimeter cubed (cm3)), high-pressure (one (1) - 100 torr) pumping capability. Other necessary items that shall be included: Specify all applicable warranty information Shipping, packing, shipping insurance Installation and acceptance testing Onsite training Coordinating with ARL, obtain solution for Universal Power Supply (UPX) All needed connections to Scienta Omicron 2RDC research chamber (two- conjoined radial distribution chambers) C. Responses: All interested parties should notify this office in writing, mail, fax, or e-mail within the posted date. Responses shall include: To what extent each of the specifications can be met. Include your type of business (i.e. commercial, academia), whether your organization is classified as a large or small business based on the 1,500 employee standard that accompanies NAICS code 333242. If a small business, you must also list any small disadvantaged status you hold [HUBZone, 8(a), Service Disabled Veteran Owned Small Business (SDVOSB), Women Owned Small Business (WOSB), Economically Disadvantaged Women-Owned Small Business (EDWOSB), etc.]. Past experience/ performance through the description of completed projects. (12) Responses to this sources sought are due no later than 11:59PM eastern standard time 16 July 2022. Submissions should be emailed to Abigail Conway at contact@example.gov. Questions concerning this sources sought may be directed to Abigail Conway at contact@example.gov. Please be advised that .zip and .exe files cannot be accepted. (13) Place of Contract Performance: Adelphi Laboratory Center (ALC), Adelphi, MD 20783 (14) Estimated Delivery Timeframe or Period of Performance: FY2023