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This Government Contract opportunity from Texas was posted on June 8, 2026. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

PECVD System Integration and Supply

Closed
State & Local

Contract Overview

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Texas A&M University is seeking a subcontractor to supply and deliver a fully integrated Plasma-Enhanced Chemical Vapor Deposition system, including the chamber, RF generator, gas delivery components, vacuum system, and Cortex control system. The equipment must be fully functional and ready for immediate installation and operation, with all necessary components integrated to ensure seamless performance in a research or manufacturing environment. Bids are due by June 16, 2026, and the solicitation falls under NAICS code 333318, indicating classification within semiconductor and other electronic component manufacturing machinery. The contract is publicly accessible through the SciQuest platform, and while no specific place of performance or point of contact is listed, the procurement is being managed under the Texas A&M University organization.

General Info

Texas A&M seeks integrated plasma-enhanced CVD system for immediate installation, bids due June 16, 2026.

Agency

Texas A&M UniversityView Agency

NAICS

333318 - Other Commercial and Service Industry Machinery ManufacturingView NAICS

Place of Performance

Not specified

Set-Aside

NONE

Documents

This scope was carved out of 28-EQUI-ITB-1699.

The full solicitation package (2 documents), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

IFB Chemical Vapor Deposition System & Etching System

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Timeline

PhaseClosed
Posted

subcontract

Response Deadline

Deadline has passed

Submission Closed

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Organization & Contact Information

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AgencyTexas A&M University
ContactsNo contacts available
OfficeN/A
Organization / Agency
Texas A&M University
View Agency Profile
Office AddressN/A
ContactsNo contact information available

Full Description

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Supply and delivery of a fully integrated Plasma-Enhanced Chemical Vapor Deposition (PECVD) system with chamber, RF generator, gas delivery, vacuum components, and Cortex control system.

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