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This Government Contract opportunity from National Aeronautics And Space Administration was posted on August 12, 2026. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Photolithography Services

Closed
Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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AI Contract Overview

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The National Aeronautics And Space Administration, through the NASA Shared Services Center, is seeking a subcontractor to provide specialized photolithography services. The scope of work involves the application of photoresist, UV exposure, and development processes specifically designed to pattern metallization layers on silicon carbide wafers. This opportunity is categorized under NAICS code 334419. Interested parties must submit their responses by the deadline of August 17, 2026, following the posting date of August 12, 2026.

General Info

NASA seeks a subcontractor for photolithography services on silicon carbide wafers by August 2026.

Agency

National Aeronautics And Space Administration → NASA Shared Services Center

NAICS

334419 - Other Electronic Component Manufacturing

Place of Performance

MS

Set-Aside

NONE

Documents

This scope was carved out of 80NSSC26941665Q.

The full solicitation package (1 document), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

Surface Micromachining of Single Crystal Silicon Carbide Sensors

AI Contract Breakdown

Uniform Contract Format

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Timeline

PhaseClosed
Posted

subcontract

Response Deadline

Deadline has passed

Submission Closed

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Organization & Contact Information

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AgencyNational Aeronautics And Space Administration → NASA Shared Services Center
ContactsNo contacts available
OfficeN/A
Organization / AgencyNational Aeronautics And Space Administration → NASA Shared Services Center
Office AddressN/A
ContactsNo contact information available

Full Description

Show more
Photoresist application, UV exposure, and development to pattern metallization layers on silicon carbide wafers.

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