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Precision Silicon Substrate Supply

Active
Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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This contract involves the supply of high-purity, defect-free silicon (Si(100)) substrates that feature an ultra-flat surface finish and sub-nanometer surface roughness, designed specifically for X-ray mirror fabrication. The goal is to procure precision silicon substrates that meet stringent quality standards necessary for advanced scientific applications, ensuring optimal performance in their intended use. The contract titled "Precision Silicon Substrate Supply" is a subcontract under the Department of Energy, specifically managed by the SLAC National Accelerator Laboratory in Menlo Park, California, with a place of performance zip code 94025. The solicitation was posted on May 27, 2026, with a response deadline set for July 1, 2026. The relevant NAICS code for this procurement is 334418, relating to semiconductor and related device manufacturing. Although details regarding set-asides and the point of contact were not provided, this opportunity is aimed at suppliers capable of delivering ultra-high-quality silicon substrates suitable for cutting-edge research and technology development.

General Info

Supply of ultra-flat, defect-free Si(100) silicon substrates for X-ray mirror fabrication.

Agency

Department Of Energy → Slac National Accel Labor -Doe Contractor

NAICS

334418 - Printed Circuit Assembly (Electronic Assembly) Manufacturing View NAICS

Place of Performance

Menlo Park, CA, 94025, USA

Set-Aside

NONE

Documents

(0)

No documents available

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Organization & Contact Information

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AgencyDepartment Of Energy → Slac National Accel Labor -Doe Contractor
ContactsNo contacts available
OfficeN/A
Organization / Agency
Department Of Energy → Slac National Accel Labor -Doe Contractor
Office AddressN/A
ContactsNo contact information available

Full Description

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Supply of high-purity, defect-free Si(100) substrates with ultra-flat surface finish and sub-nm roughness suitable for X-ray mirror fabrication.

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