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This Government Contract opportunity from Texas was posted on June 8, 2026. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Reactive Ion Etching (RIE) System Supply with Upgraded Gas Box

Closed
State & Local

Contract Overview

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Texas A&M University is seeking a subcontractor to supply a Reactive Ion Etching (RIE) system complete with an upgraded external gas box, RF power supply, vacuum system, process chamber, and integrated control interface. The equipment must meet specified technical requirements for precision etching applications in research and development settings, with the upgraded gas box enabling enhanced gas delivery flexibility and process control. The solicitation is open for responses until June 16, 2026, and is classified under NAICS code 333318 for semiconductor machinery manufacturing. The place of performance and point of contact details are not specified, but all proposals must be submitted through the provided SciQuest platform link. The contract type is a subcontract, indicating the award recipient will deliver the system to support institutional research infrastructure rather than a direct federal procurement.

General Info

Texas A&M seeks subcontractor to supply upgraded RIE system for research, due June 16, 2026, via SciQuest.

Agency

Texas A&M UniversityView Agency

NAICS

333318 - Other Commercial and Service Industry Machinery ManufacturingView NAICS

Place of Performance

Not specified

Set-Aside

NONE

Documents

This scope was carved out of 28-EQUI-ITB-1699.

The full solicitation package (2 documents), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

IFB Chemical Vapor Deposition System & Etching System

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Timeline

PhaseClosed
Posted

subcontract

Response Deadline

Deadline has passed

Submission Closed

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Organization & Contact Information

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AgencyTexas A&M University
ContactsNo contacts available
OfficeN/A
Organization / Agency
Texas A&M University
View Agency Profile
Office AddressN/A
ContactsNo contact information available

Full Description

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Supply of a Reactive Ion Etching (RIE) system with upgraded external gas box, including RF power supply, vacuum system, chamber, and control interface.

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