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RF Plasma Source Supply

Active
Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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The contract seeks the supply of a nitrogen RF plasma source designed for integration into molecular beam epitaxy systems, with strict technical requirements including construction from pyrolytic boron nitride, water cooling for thermal management, and a 4.5-inch Conflat flange for seamless system integration. The plasma source must support gallium nitride growth rates within the range of 0.2 to 2 micrometers per hour to meet the precision demands of advanced semiconductor research. The device is intended for use within a NIST facility located in Boulder, Colorado, with a zip code of 80305, and must comply with all operational and performance benchmarks to ensure reliability in high-purity epitaxial layer deposition. This is a subcontract opportunity under NAICS code 333318, posted on July 31, 2026, with a response deadline of August 12, 2026, by 11:00 PM. The contracting organization is the Department of Commerce, specifically under the National Institute of Standards and Technology, and the solicitation is administered through the SAM.gov platform. There is no set-aside designation, and no point of contact is listed in the provided data, implying that all inquiries and submissions must follow standard SAM.gov procedures. The equipment must be delivered and verified to meet exacting standards to support ongoing research in nitride-based semiconductor technology.

General Info

Nitrogen RF plasma source for NIST Boulder, pyrolytic boron nitride, water cooled, 4.5-inch Conflat, 0.2–2 µm/h GaN growth.

Agency

Department Of Commerce NistView Agency

NAICS

333318 - Other Commercial and Service Industry Machinery ManufacturingView NAICS

Place of Performance

CO, 80305, USA

Set-Aside

NONE

Documents

(0)

No documents available

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Organization & Contact Information

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AgencyDepartment Of Commerce Nist
ContactsNo contacts available
OfficeN/A
Organization / Agency
Department Of Commerce Nist
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Office AddressN/A
ContactsNo contact information available

Full Description

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Supply of a nitrogen RF plasma source for molecular beam epitaxy (MBE) systems, meeting technical specifications including PBN construction, water cooling, 4.5” CF flange, and GaN growth rate of 0.2–2 µm/h.

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