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RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching

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The Department of Commerce is seeking scientific services to support fundamental metrology research under the CHIPS R&D Metrology program project 5.04, titled RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching. The selected contractor will be responsible for the assembly and operation of plasma etch chambers and the implementation of advanced optical diagnostics. Key technical requirements include performing temporally and spatially resolved optical emission spectroscopy, mid-infrared laser absorption spectroscopy, and Langmuir probe measurements. Additionally, the contractor will handle data processing and interpretation to correlate diagnostic results with radio frequency waveform and time-resolved frequency-comb measurements. The scope of work extends to providing model validation support and preparing technical materials for review and dissemination by NIST. This project will be performed in Gaithersburg and falls under NAICS code 541690.

General Info

Commerce seeks scientific services for plasma etching metrology research and optical diagnostics.

Agency

Department of Commerce

NAICS

541690 - Other Scientific and Technical Consulting Services

Place of Performance

GAITHERSBURG, MD, USA

Set-Aside

NONE

Documents

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Organization & Contact Information

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AgencyDepartment of Commerce
Contacts2 people available
OfficeN/A
Organization / Agency
Department of Commerce
Office AddressN/A
Contacts

Full Description

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Obtain scientific services to support fundamental metrology research for the development and operation of advanced optical diagnostics for plasma etching processes under the CHIPS R&D Metrology program project 5.04, “RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching.” The Contractor shall provide technical services for plasma etch chamber assembly and operation, in situ optical diagnostics, temporally and spatially resolved optical emission spectroscopy, mid-infrared laser absorption spectroscopy, Langmuir probe measurements, data processing and interpretation, correlation of diagnostic results with time-resolved frequency-comb and radio frequency (RF) waveform measurements, model validation support, and preparation of technical materials for NIST review and dissemination.

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