RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching
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The Department of Commerce is seeking scientific services to support fundamental metrology research under the CHIPS R&D Metrology program project 5.04, titled RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching. The selected contractor will be responsible for the assembly and operation of plasma etch chambers and the implementation of advanced optical diagnostics. Key technical requirements include performing temporally and spatially resolved optical emission spectroscopy, mid-infrared laser absorption spectroscopy, and Langmuir probe measurements. Additionally, the contractor will handle data processing and interpretation to correlate diagnostic results with radio frequency waveform and time-resolved frequency-comb measurements. The scope of work extends to providing model validation support and preparing technical materials for review and dissemination by NIST. This project will be performed in Gaithersburg and falls under NAICS code 541690.
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GAITHERSBURG, MD, USASet-Aside
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