Sources Sought Notice of Intent to Sole Source for Preventative Maintenance on a Chemical Mechanical Planarization System (CMP)
Contract Overview
Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.
AI Contract Overview
The U.S. Department of Commerce, National Institute of Standards and Technology (NIST), located in Gaithersburg, Maryland, has issued a Sources Sought Notice of Intent to Sole Source for preventative maintenance services on a Chemical Mechanical Planarization System (CMP). This notice, identified by solicitation number NIST-SS26-15 and posted on July 17, 2026, seeks to evaluate potential vendors capable of providing specialized maintenance for the CMP system, emphasizing the need for technical expertise and equipment-specific knowledge that may only be available from a single source. The response deadline for submissions is August 3, 2026, at 4:00 PM Eastern Time, and the contract falls under NAICS code 811210, which pertains to industrial and commercial machinery and equipment repair and maintenance. The place of performance is also in Gaithersburg, Maryland, aligning with NIST’s primary operational location. The contracting office is structured as a single-entity organization within the Department of Commerce, with no set-aside provisions indicated, meaning this opportunity is open to all qualified vendors, though the intent is to proceed on a sole-source basis. Primary point of contact for inquiries is Elizabeth Timberlake, reachable at elizabeth.timberlake@nist.gov, with Tracy Retterer serving as the secondary contact. Interested parties must review the notice through the official SAM.gov portal to understand technical requirements, service expectations, and submission guidelines prior to the deadline.
General Info
Agency
NAICS
Place of Performance
Gaithersburg, MD, 20899, USASet-Aside
Documents
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Timeline
Response Deadline
Organization & Contact Information
Full Description
See attached Sources Sought Notice of Intent to Sole Source for Preventative Maintenance on a Chemical Mechanical Plantarization System (CMP).
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