Supply of Nitrogen RF Plasma Source for MBE System

The contract is for the supply of a nitrogen RF plasma source designed to be fully compatible with a Veeco Gen 10 molecular beam epitaxy system, specifically to enable the fabrication of GaN and AlGaN nanostructures. The plasma source is constructed using pyrolytic boron nitride to ensure high purity and thermal stability under operating conditions, and includes a CF flange for high-vacuum compatibility and a water-cooled RF feedthrough to manage heat generated during plasma generation. The equipment must meet rigorous performance and interface standards to integrate seamlessly into the existing MBE platform without modifications. This subcontract, issued by the Department of Commerce through the National Institute of Standards and Technology, is posted with a response deadline of July 24, 2026, and the place of performance is located in an area with a ZIP code of 80305. The NAICS code 334519 indicates the scope is related to other electronic component manufacturing, reflecting the specialized nature of the plasma source as a custom-built instrument. There is no set-aside designation, meaning all eligible suppliers may compete, and the procurement is conducted under the broader mission of advancing semiconductor fabrication capabilities for next-generation materials research.