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The Blueprint for Generative AI chips manufactured on the ISS

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NASA-SBIR-185514SBIR / STTR

Contract Overview

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This solicitation by the NASA SBIR/STTR Program aims to develop next generation Extreme Ultraviolet Photomasks on the International Space Station to serve as hardware blueprints for 3D heterogeneous integrated circuits. These components are essential for the production of generative AI chips used in robotics, data centers, medical technology, and connected cars. By leveraging the unique manufacturing environment of space, the project seeks to produce photomasks with superior performance for leading edge semiconductor technology nodes ranging from 7nm down to 1nm. The initiative supports the expansion of commercial activities and in-space manufacturing while strengthening U.S. leadership in semiconductor production. Beyond its terrestrial applications in high-end IC manufacturing, the project contributes to the sustainability of human space exploration by developing essential technologies for a space-based ecosystem. This total small business set-aside opportunity is managed by the National Aeronautics and Space Administration and is focused on advancing the global semiconductor industry through space-based innovation.

General Info

NASA SBIR/STTR program developing next-generation EUV photomasks on the ISS for AI chips.

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PhaseSolicitation
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Organization & Contact Information

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AgencyNational Aeronautics and Space Administration → NASA SBIR/STTR Program
Contacts4 people available
OfficeUSA
Office AddressUSA
Contacts
Narasimha S PrasadProject Manager
Supriya JaiswalPrincipal Investigator
Jason L KesslerProgram Director
Carlos TorrezProgram Manager

Full Description

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The democratization of Artificial Intelligence (AI) catalyses an industrial revolution for next generation 3D heterogeneous integrated circuits (ICs) to create generative AI chips. Future demand remains boundless driven by innovations in every industrial sector becoming dependent on automation, AI and data science. Generative AI chips will be used in everything from robotics, data centers, connected cars, to medical technology and cryptocurrency. We propose to develop next generation Extreme Ultraviolet Photomasks on the International Space Station. These photomasks form the hardware blueprint of 3D heterogeneous integrated circuits used for generative AI chips. The ultimate goal of this work is to contribute to a semiconductor ecosystem on board the International Space Station, to create EUV photomasks, which due to the superior manufacturing environment will have superior performance on earth at the leading edge of the semiconductor industry.
Benefits: This technology and proposal supports the enablement of commercial activities aboard the ISS. In this proposal the ISS capabilities support the demand for commercial products development and strengthen U.S. leadership in in-space manufacturing and production. Further it supports the mission of human space exploration in providing key essential technologies that extend human life in space and provided the necessary products for a sustainable ecosystem. Finally it supports the advancement of key leading edge industries, like semiconductors, on earth at the forefront of science and technology. Primary Non NASA Applications exist in applications requiring EUV photomasks for next generation EUV Lithography and IC manufacturing for for technology nodes 7, 5, 3, and 1 nm.. Astrileux has established strategic interest from many potential customers in mask applications in these fields.

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