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Thin Film Coating and Annealing Equipment

Active

Federal

Response Deadline09/04/2026, 08:00:00 PM UTC

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

AI Contract Overview

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The National Energy Technology Lab under the Department of Energy is seeking a subcontractor for the supply and integration of specialized thin film processing equipment. The scope of work includes the procurement of drop casting, spin coating, dip coating, and N2/air drying systems, as well as an 8-stage annealer designed for planar substrates with an operational temperature range between 25 and 500 degrees Celsius. This subcontract opportunity is categorized under NAICS code 333295. The solicitation was posted on August 25, 2026, with a response deadline of September 4, 2026. Interested parties can find further details through the provided FedConnect link.

General Info

DOE seeks subcontractor for thin film processing equipment and an 8-stage annealer.

Agency

Department Of Energy → National Energy Technology LabView Agency

NAICS

333295 - Semiconductor Machinery ManufacturingView NAICS

Place of Performance

Not specified

Set-Aside

NONE

Documents

This scope was carved out of 89243326NFE000257.

The full solicitation package (1 document), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

Sources Sought for Robotic Lab System

AI Contract Breakdown

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No contract breakdown available.

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Timeline

PostedAug 25

subcontract

Response DeadlineSep 4

Submission deadline

Response Deadline

09/04/2026, 08:00:00 PM UTCin 9 days

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Organization & Contact Information

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AgencyDepartment Of Energy → National Energy Technology Lab

ContactsNo contacts available

OfficeN/A

Organization / Agency

Department Of Energy → National Energy Technology Lab

View Agency Profile

Office AddressN/A

ContactsNo contact information available

Full Description

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Supply and integration of drop casting, spin coating, dip coating, and N₂/air drying systems, along with an 8-stage annealer capable of 25–500°C operation for thin film processing on planar substrates.

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