A--SIMS Analysis and Reporting
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The Electronic Systems Center at Hanscom AFB, MA, is seeking potential contractors capable of performing Secondary Ion Mass Spectrometry (SIMS) analysis on semiconductor bulk crystals and film samples to conduct compositional trace element analysis. This effort involves analyzing specimens provided by the government, specifically focusing on impurity detection across several calibration standards including AlN, GaAs, GaN, GaSb, and ZnO. The impurities of interest vary depending on the calibration material, ranging from elements like carbon, oxygen, and silicon to a broader list including metals and nonmetals such as manganese, zinc, selenium, and tellurium. Contractors will be required to perform analyses on bulk crystal specimens measuring at least 5 mm by 5 mm, as well as layered surface specimens of similar size, and deliver detailed reports that include detection limits, elemental quantification, instrumental conditions, and graphical presentations of element concentration versus depth. Over a period of one year, approximately 30 specimens—20 bulk and 10 layered—will be provided by AFRL/SHNC for analysis. Each specimen analyzed requires a report to be submitted within two weeks of receipt, detailing the trace analysis results with precise concentration data. Interested firms are asked to submit a capabilities statement that includes company information, contact details, and references for similar past services demonstrating their ability to meet these technical requirements. This Sources Sought Synopsis is meant to gather industry interest and capabilities and does not constitute a solicitation or guarantee of contract award. Responses are voluntary and unpaid, with further updates expected on the Federal Business Opportunities website. Questions and responses regarding this opportunity were to be submitted by April 12, 2004, to the specified Contract Specialist.
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