This Subcontract opportunity from National Aeronautics And Space Administration was posted on December 18, 2025. The submission period has ended. Browse the details below for market research, or find similar active opportunities.
AI-Assisted Process Modeling for DRIE Optimization
Contract Overview
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The NASA Shared Services Center is seeking a subcontractor for the AI-Assisted Process Modeling for DRIE Optimization project. The primary objective of this engagement is the development of AI and machine learning models designed to optimize Deep Reactive Ion Etching process parameters specifically for 4H-SiC etching. Key performance goals include the improvement of etch rates, the enhancement of uniformity, and the reduction of defects when AI is integrated into recipe development. This opportunity was posted on December 18, 2025, with a response deadline of December 22, 2025. The contract falls under NAICS code 541715, focusing on research and experimental development within the field of semiconductor processing and artificial intelligence.
General Info
Place of Performance
MS, USASet-Aside
Documents
This scope was carved out of 80NSSC26921522Q.
The full solicitation package (2 documents), including the RFP, is on the prime solicitation, not on this scope.
Deep Reactive Ion Etching of Single Crystal 4H-SiC
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Timeline
Submission Closed
Organization & Contact Information
Full Description
More opportunities from National Aeronautics And Space Administration → NASA Shared Services Center
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