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APXPS spectrometer with differential pumping system and detector

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Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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The Department of Commerce, through the Office of the Director, is seeking an APXPS spectrometer equipped with a differential pumping system and detector to be located in Gaithersburg, Maryland. This procurement supports the development of a new plasma-XPS metrology platform designed for quantitative, sub-monolayer sensitive in-situ chemical analysis of wafer surfaces, thin films, and interfaces during plasma processing. By leveraging expertise in plasma-surface interaction and operando photoelectron spectromicroscopy, the project aims to enhance semiconductor process development and inspection toolsets for next-node technology. The initiative involves collaboration between NIST, industrial partners, and academic institutions to advance the fundamental measurement science of plasma-surface interactions.

General Info

Commerce seeks an APXPS spectrometer for plasma-XPS metrology development in Gaithersburg, Maryland.

Agency

Department Of Commerce → Office of the Director

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD

Set-Aside

NONE

Documents

0

No documents available

Documents will appear here when they are available.

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Timeline

PostedDec 3

forecast

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Organization & Contact Information

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AgencyDepartment Of Commerce → Office of the Director

Contacts1 person available

OfficeN/A

Organization / AgencyDepartment Of Commerce → Office of the Director

Office AddressN/A

Contacts

NATHALI MEDINA

contact@example.gov

Full Description

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Advanced in situ and operando methods for real time monitoring of the chemical status of wafer surfaces, thin films, and interfaces during plasma processing are essential for semiconductor process development and control. We will build upon NIST's leading expertise in plasma-surface interaction, plasma diagnostics, and operando photoelectron spectromicroscopy to develop a new plasma-XPS metrology platform for quantitative sub-monolayer sensitive in-situ chemical analysis of wafer surfaces during plasma processing. This innovative metrology will be a valuable addition to the next node semiconductor process development and inspection toolset and, in a broader scope, to the fundamental measurement science of plasma-surface interaction. We will collaborate with industrial partners (see letters of support) and academia in the development, implementation, and dissemination of plasma-XPS metrology. The data generated during this project and th

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