Boulder EUV Source Use (Budget Mod Eval)

The Boulder EUV Source Use project, managed by the Department of Commerce Office of the Director, focuses on establishing critical standards for the characterization of extreme ultraviolet light power and energy. Because EUV light is essential for modern semiconductor manufacturing and the fabrication of advanced chips, there is a pressing need for standardized measurement capabilities at industrial conditions. This initiative will enable NIST to collaborate with industry partners to develop tools for both high-power lithography and lower-power support applications, such as reflectivity and transmission measurements. This forecast is categorized under NAICS code 334413 and specifies that the place of performance will be in Boulder, Colorado. The project aims to bridge the current gap in EUV light characterization to support the present and future requirements of the semiconductor industry. Interested parties can coordinate through the designated point of contact, Nathali Medina, via the provided government channels.