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Epitaxial Growth of SiGe Films (10–15% Ge)

Active

Federal

Response Deadline08/28/2026, 05:00:00 PM UTC

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

General Info

Agency

Department Of Commerce NistView Agency

NAICS

334413 - Semiconductor and Related Device ManufacturingView NAICS

Place of Performance

MD

Set-Aside

SBA

Documents

This scope was carved out of 1333ND26QNB030476.

The full solicitation package (1 document), including the RFP, is on the prime solicitation, not on this scope.

View the prime solicitation

Silicon and Silicon/Germanium Epitaxial Wafers

AI Contract Breakdown

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Timeline

PostedAug 13

subcontract

Response DeadlineAug 28

Submission deadline

Response Deadline

08/28/2026, 05:00:00 PM UTCin 14 days

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Organization & Contact Information

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AgencyDepartment Of Commerce Nist

ContactsNo contacts available

OfficeN/A

Organization / Agency

Department Of Commerce Nist

View Agency Profile

Office AddressN/A

ContactsNo contact information available

Full Description

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Grow silicon-germanium epitaxial layers with 10–15% Ge concentration and 20–30 nm thickness, requiring control over doping, strain, and crystallinity.

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