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High Resolution chromatography and mass spectrometry

Active

Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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The Department of Commerce Office of the Director is forecasting a requirement for high resolution chromatography and mass spectrometry to support semiconductor manufacturing yield enhancement. The initiative focuses on developing advanced metrological capabilities to detect, identify, and quantify critical contaminants in cleaning chemicals, which is essential for the production of next generation chips requiring extreme material purity. The scope of work is divided into three primary projects targeting organic contaminant identification and quantification, the analysis of native particulates and precursors, and the rapid detection of surface particles and impurities in both water and non-water solvents. This effort will be performed in Gaithersburg, Maryland, under NAICS code 334413 to establish a practical roadmap for assessing material purity.

General Info

Commerce seeks chromatography and mass spectrometry for semiconductor contaminant detection in Gaithersburg, Maryland.

Agency

Department Of Commerce → Office of the Director

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD

Set-Aside

NONE

Documents

0

No documents available

Documents will appear here when they are available.

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Timeline

PostedDec 2

forecast

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Organization & Contact Information

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AgencyDepartment Of Commerce → Office of the Director

Contacts1 person available

OfficeN/A

Organization / AgencyDepartment Of Commerce → Office of the Director

Office AddressN/A

Contacts

NATHALI MEDINA

contact@example.gov

Full Description

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Semiconductor manufacturing yield enhancement requires ongoing risk analysis of cleaning chemical purity wherein critical contaminants are already at levels difficult or impossible to detect, let alone identify and quantify. Next generation chips will require even purer materials and advanced metrological capabilities for the detection, identification, and quantification of impurities in semiconductor cleaning chemicals necessitating a practical roadmap for assessing material purity commensurate with the needs of the next generation in semiconductor manufacturing. To this end, three projects addressing different components of this theme are proposed: organic contaminant identification and quantification, native particulates and precursors and rapid surface particle-, and impurity detection and quantification in water/non-water solvents.

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