Invitation to bid for ICP-RIE (Fluorine), ICP-RIE (Chlorine), and PECVD cleanroom equipment

Texas State University is soliciting bids for three specific pieces of cleanroom equipment designed for precise material processing in controlled environments. The equipment includes two types of Inductively Coupled Plasma Reactive Ion Etchers (ICP-RIE) using fluorine and chlorine chemistries, respectively, and one Plasma Enhanced Chemical Vapor Deposition (PECVD) system. All three pieces must be supplied by a single manufacturer capable of supporting and servicing the equipment, ensuring it operates accurately within particle-controlled cleanroom conditions. These systems are intended to allow operators to finely control critical process parameters such as chamber pressure, electrical bias, gas flow, temperature, and sample positioning to facilitate etching or deposition on substrates and thin films through chemical or physical methods. The invitation to bid, identified by solicitation number 754-TXST-2026-IFB-453-CRO, was posted on January 9, 2026, with responses due by January 30, 2026. The procurement falls under the NAICS code 325180, which relates to basic chemical manufacturing, and is managed by Texas State University located in San Marcos, Texas. Interested suppliers must ensure their bids meet the university’s specifications for cleanroom compatibility and process control capability. The primary contact for this solicitation is Dan Alden, reachable via email or phone, for any inquiries. The full solicitation details are accessible through the Texas state procurement portal.