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Laser Induced Breakdown Spectroscopy (LIBS) and Laser Ablation Inductively Coupled Plasma Mass Spectrometry (LA-ICP-MS) tandem instrument

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Federal

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The Department of Commerce, through the Office of the Director, is seeking to develop high-purity solid Standard Reference Materials, Reference Materials, and Research Grade Test Materials to address current shortages in chips manufacturing. This initiative aims to enhance process control and enable more efficient characterizations of source materials. To support these objectives, the project will focus on advancing NIST capabilities in laser-based analytical methods and glow discharge mass spectrometry, while simultaneously reducing detection limits for existing nuclear techniques. The technical scope involves the implementation of a tandem instrument utilizing Laser Induced Breakdown Spectroscopy and Laser Ablation Inductively Coupled Plasma Mass Spectrometry. Based in Gaithersburg, Maryland, the project emphasizes technology transfer to help U.S. industry establish internal measurement capabilities. NIST will further support the industry by providing access to these new measurement facilities through collaborative agreements.

General Info

Commerce seeks high-purity reference materials to improve chip manufacturing and analytical measurement capabilities.

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD

Set-Aside

NONE

Documents

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Timeline

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Organization & Contact Information

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AgencyDepartment Of Commerce → Office of the Director
Contacts1 person available
OfficeN/A
Office AddressN/A
Contacts
NATHALI MEDINA

Full Description

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We will develop new Standard Reference Materials (SRMs), Reference Materials (RMs), and Research Grade Test Materials (RGTMs) of high-purity solids currently lacking in chips manufacturing, enabling more effective, efficient, and comparable characterizations of source materials, as well as process control improvements. To achieve these goals, we will develop new NIST capabilities in glow discharge mass spectrometry (GDMS) and laser-based analytical methods, and we will significantly lower detection limits for existing NIST nuclear techniques. Technology transfer will enable U.S. industry to establish new measurement capabilities in their own facilities, and NIST will provide access to the newly established NIST measurement facilities via suitable collaborative agreements

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