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Light Conversion Carbide/Orpheus, NIR Laser

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Federal

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The Department of Commerce Office of the Director is seeking to advance thermal metrology through the development of new tools for mapping thermal conductivity and interfacial thermal conductance at the nanoscale. This initiative aims to achieve high precision and significantly increased throughput by utilizing wide bandwidth detection of transient photothermal expansion. The technical approach involves the use of either NIST-made optomechanical AFM probes for high-resolution mapping or a far-field, super-resolution microscope for increased depth sensitivity and speed. This forecast, titled Light Conversion Carbide/Orpheus, NIR Laser, is associated with NAICS code 334413 and will be performed in Gaithersburg, Maryland. The project focuses on overcoming current limitations in measuring thermal properties to enable the engineering of advanced and heterogeneously integrated devices. Interested parties may coordinate through the designated point of contact, Nathali Medina.

General Info

Commerce seeks tools for nanoscale thermal conductivity mapping via transient photothermal expansion detection.

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD

Set-Aside

NONE

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Organization & Contact Information

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AgencyDepartment Of Commerce → Office of the Director
Contacts1 person available
OfficeN/A
Office AddressN/A
Contacts
NATHALI MEDINA

Full Description

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Precise measurements of thermal properties at the nanoscale are needed for engineering of advanced and heterogeneously integrated devices but are currently unattainable. We will radically advance thermal metrology by developing new tools for mapping thermal conductivity (¿) and interfacial thermal conductance (G) at the nanoscale, with high precision (¿¿<5%, ¿G<10%) and throughput (˜25·106improvement). This will be achieved by wide bandwidth detection of the transient photothermal expansion of a sample using either NIST-made optomechanical AFM probes (˜10¿nm resolution, 20 ms/pixel) or a far-field, super-resolution microscope (˜500 nm resolution, ˜5 µs/pixel, ˜100 µm depth sensitivity).

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