Lithographic Patterning Strategy & Process Development
Contract Overview
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AI Contract Overview
This subcontract, titled Lithographic Patterning Strategy and Process Development, supports the Office of the Secretary of Defense by conducting lithographic patterning and integration research for prime contractors. The primary objective is to identify and develop viable methods for patterning hyperbolic thin films into device-grade architectures utilizing nano-imprint systems, photolithography, or electron-beam technology. Additionally, the contractor is responsible for creating integration plans specifically for quantum light source architectures or microelectronics. The project culminates in the delivery of a comprehensive technical report and a Phase II integration plan. This opportunity is designated as a Total Small Business Set-Aside under NAICS code 541330, specifically adhering to SBIR/STTR mandates for companies with fewer than 500 employees. The solicitation was posted on November 4, 2026, with a response deadline of December 2, 2026.
General Info
Place of Performance
Not specifiedSet-Aside
Documents
This scope was carved out of OSW27TZ02-NV001.
The full solicitation package (2 documents), including the RFP, is on the prime solicitation, not on this scope.
Wafer-scale low-loss hyperbolic optical material
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