Wafer-scale low-loss hyperbolic optical material

Solicitation OSW27TZ02-NV001 is a Phase I Small Business Technology Transfer (STTR) effort managed by the Office of the Secretary of Defense to establish a domestic supply of wafer-scale, low-loss hyperbolic optical materials. The objective is to develop fabrication-ready thin films that operate across visible and telecommunication wavelengths, overcoming the diffraction limits of conventional optical systems. The project requires the development of high-quality crystalline films on substrates at least one inch in diameter, compatible with standard semiconductor fabrication. This effort is a total small business set-aside and requires a partnership with a research institution. The project is structured in phases, with Phase I focusing on feasibility, performance projections, and the identification of lithographic patterning approaches over a six to twelve month period. Subsequent phases aim to deliver reproducible wafer-scale films and transition the technology to operational use in fields such as quantum light sources and microelectronics fabrication. Proposals are evaluated based on technical merit, investigator qualifications, and commercial potential, with additional scrutiny regarding cost and foreign security risks. All work is expected to be performed at the Unclassified//CUI level, and applicants must comply with CMMC cybersecurity requirements and disclose any organizational conflicts of interest.