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Photonic Probe Station

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Federal

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The Photonic Probe Station project, managed by the Department of Commerce Office of the Director and performed in Gaithersburg, Maryland, focuses on advancing silicon photonics to support chip-scale information processing systems. As major semiconductor firms integrate photonic transceiver chips with processors, this initiative aims to address critical measurement gaps within the semiconductor ecosystem to maximize the impact of integrated photonics. The effort is divided into two primary technical thrusts. First, the team will develop specific test structure designs and a general design methodology to optimize the extraction of material and device optical properties. Second, the project will focus on measuring and mitigating optical loss resulting from induced surface roughness in photonic structures.

General Info

Commerce project in Maryland developing silicon photonics test structures to reduce optical loss.

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD

Set-Aside

NONE

Documents

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Organization & Contact Information

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AgencyDepartment Of Commerce → Office of the Director
Contacts1 person available
OfficeN/A
Office AddressN/A
Contacts
NATHALI MEDINA

Full Description

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The length scale over which light is used for communication in information processing systems has steadily reduced. Silicon photonics is now crucial down to the chip scale, with major semiconductor companies such as Intel, Nvidia, and HP incorporating photonic transceiver chips with processors at the package level. To maximize the impact of silicon photonics for the semiconductor ecosystem, several measurement needs must be urgently addressed. Within this CHIPS effort, our team will focus on two thrusts that have been identified as key priorities by the integrated photonics industry: the development of specific test structure designs and a general design methodology that enable optimized measurements for extraction of device and material optical properties, and the measurement and mitigation of optical loss caused by induced surface roughness in photonic structures.

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