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Raith EBPG 5200 Plus Service Contract

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Federal

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The Department of Commerce is seeking a service contract for two Raith EBPG 5200 Plus electron beam lithography systems located in Gaithersburg. Due to the highly specialized expertise required for maintenance, these systems must be serviced by the original equipment manufacturer. This equipment is vital for the repeatable lithographic processing of semiconductor substrates, which is necessary for the production of nanoscale devices used in quantum measurement sciences and measurement standards. These capabilities are hosted within the CNST NanoFab as a shared resource and are critical to the goals of the CHIPS Act. By maintaining these systems, the agency aims to address major metrology research and development challenges essential for the reliable production of next generation microelectronic devices. The procurement is categorized under NAICS code 811210.

General Info

OEM maintenance for two Raith EBPG 5200 Plus electron beam lithography systems.

Agency

Department of Commerce

NAICS

811210 - Electronic and Precision Equipment Repair and Maintenance

Place of Performance

GAITHERSBURG, MD, USA

Set-Aside

NONE

Documents

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Organization & Contact Information

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AgencyDepartment of Commerce
Contacts2 people available
OfficeN/A
Organization / Agency
Department of Commerce
Office AddressN/A

Full Description

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EBL is an essential tool for prototyping advanced quantum devices and measurement standards. This technology is also critical for the fabrication of diverse nanoscale devices within the CHIPS program. The 2 sophisticated electron beam lithography (EBL) systems require a service contract and can only be serviced by the original equipment manufacturer due to the specialized expertise required to attain proper maintenance and of 2 EBL systems. The EBL facilitates repeatable lithographic processing of semiconductor substrates that's required for manufacturing and reliable production of nanoscale semiconductor devices in the arena of quantum measurement sciences and measurement standards. Also, in support of the CHIPS Act, the EBL systems will address the major metrology R&D grand challenges for the reliable production of next generation microelectronic devices. These capabilities are accessible within the CNST NanoFab as a shared resource f

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