Semiconductor Process Residual Gas Analyzer
Contract Overview
Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.
AI Contract Overview
Solicitation 1333ND26QNB640573 is a Request for Quotation issued by the Department of Commerce NIST for a semiconductor-grade Process Residual Gas Analyzer. The equipment will be utilized by the Chemical Process and Nuclear Measurements Group within a CHIPS R&D Metrology program to develop digital twin technology for semiconductor manufacturing. The RGA is intended for use as an online process diagnostic on flow systems, such as ALD reactors, and must be compatible with process gases as well as metal halide and low-volatility organometallic precursors. This procurement is open for full and open competition under NAICS code 334516 for Analytical Laboratory Instrument Manufacturing. The performance location is based in Gaithersburg, Maryland. Interested parties must submit their quotations by the response deadline of September 14, 2026.
General Info
Agency
NAICS
Place of Performance
Gaithersburg, MD, 20899, USASet-Aside
Documents
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Timeline
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Organization & Contact Information
Full Description
SOLICITATION 1333ND26QNB640573
Semiconductor Process Residual Gas Analyzer
This is a solicitation for commercial items prepared in accordance with the format in RFO Subpart 12.2, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; quotations are being requested, and a separate written document will not be issued.
This solicitation is a Request for Quotation (RFQ).
The associated North American Industrial Classification System (NAICS) code for this procurement is 334516 – Analytical Laboratory Instrument Manufacturing with a Small Business size standard of 1,000 Employees. This requirement will be a Full and Open Competition.
The Chemical Process and Nuclear Measurements Group is seeking a semiconductor-grade Process Residual Gas Analyzer (RGA) for use on flow systems, including an ALD reactor, as part of a CHIPS R&D Metrology program. This program focuses on developing digital twin technology for semiconductor manufacturing equipment. The flow systems, equipped with in situ and inline sensors, are used to acquire process data on thin film growth characterization. The RGA will serve as an online process diagnostic. The RGA must be compatible with low-volatility organometallic and metal halide precursors and process gases. The data and models generated by this project will lead to improvements in process optimization and control, ultimately resulting in cost savings for the US semiconductor industry.
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