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Service contracts for KM Labs EUV HHG laser system

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Contract Overview

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AI Contract Overview

This forecast involves service contracts for a KM Labs EUV HHG laser system to support the development of advanced integrated circuits manufacturing. The project focuses on innovating extreme ultraviolet optics, tabletop sources, and methodologies for inspection and process control using the 10 nm to 150 nm spectral range. By leveraging the SURF III synchrotron and compact in-lab sources, the initiative aims to significantly enhance chemical and dimensional characterization through a thousandfold increase in gathered information and superior spatial resolution. Managed by the Department of Commerce Office of the Director, the work will be performed in Gaithersburg, Maryland. The primary objective is to advance leading-edge technology over the next decade and proactively transfer these metrological innovations to the U.S. industry. The procurement is categorized under NAICS code 334413.

General Info

Service contracts for KM Labs EUV laser system to advance integrated circuit manufacturing.

Agency

Department Of Commerce → Office of the Director

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

GAITHERSBURG, MD

Set-Aside

NONE

Documents

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Uniform Contract Format

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Timeline

PostedDec 3

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Organization & Contact Information

AgencyDepartment Of Commerce → Office of the Director

Contacts1 person available

OfficeN/A

Organization / AgencyDepartment Of Commerce → Office of the Director

Office AddressN/A

Contacts

NATHALI MEDINA

contact@example.gov

Full Description

We will use scatterometry to benefit advanced integrated circuits (IC) manufacturing. We propose to develop novel extreme ultraviolet (EUV) optics, tabletop sources, and methodologies for inspection and process control. This project will innovate novel approaches to utilizing the 10 nm to 150 nm spectral range for chemical and dimensional characterization of leading-edge technologies over the next decade. NIST is uniquely positioned as our SURF III synchrotron is an optimal source for this radiation, allowing parallel work on metrological aspects with an in-lab compact source. Through a combination of ten times greater spatial resolution in each dimension and the ability to penetrate materials using shorter wavelengths, we will achieve an increase in the information gathered through fast optical techniques by a factor of 1000. We will proactively transfer these technologies to U.S. industry through existing and expanded relationships.