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University of Calgary - Advanced Contract Award Notice / Notice of Proposed Procurement - Maskless Aligner System

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AB-2026-06619International

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The University of Calgary intends to procure an MLA 150 Maskless Aligner System from Spectra Research Corporation, the sole authorized Canadian representative of Heidelberg Instruments. This acquisition is designated for the qLab to support multi-user semiconductor cleanroom operations and the fabrication of quantum devices across various substrates, including diamond and other transparent or delicate materials. The system is required to provide a minimum feature size of 1 micrometer, dual laser wavelengths of 405 nm and 375 nm for photoresist compatibility, and real-time autofocus capabilities to ensure sufficient throughput and precision. This procurement is being handled as a sole-source acquisition because the MLA 150 is the only system identified that meets the specific functional and technical requirements of the university. The solicitation, identified by number AB-2026-06619, was posted on October 1, 2026, with a response deadline of October 8, 2026. The project is based in Alberta and is managed by Senior Procurement Specialist Ling Li.

General Info

University of Calgary sole-source procurement of MLA 150 Maskless Aligner from Spectra Research.

Place of Performance

AB, CAN

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Organization & Contact Information

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AgencyUniversity of Calgary
Contacts1 person available
OfficeN/A
Organization / AgencyUniversity of Calgary
Office AddressN/A
Contacts
Ling LiSenior Procurement Specialist

Full Description

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The University of Calgary (UCalgary) intends to purchase the MLA 150 System from Spectra Research Corporation, the sole authorized Canadian representative of Heidelberg Instruments for this system. UCalgary’s qLab requires a direct-write maskless lithography system that can support multi-user semiconductor cleanroom operations and the fabrication of quantum devices on a range of substrates, including transparent and challenging materials such as fabrication on diamond. The required system must provide maskless lithography with a minimum feature size of 1 μm, dual laser wavelengths of 405 nm and 375 nm to support required photoresist compatibility, real-time autofocus capability for transparent, patterned, warped, or delicate substrates, and sufficient throughput for cleanroom use. Based on the technical assessment completed by qLab, the MLA 150 Maskless Aligner System is the only known system currently capable of meeting these required functional and technical capabilities, and Spectra Research Corporation is the only authorized Canadian vendor for this system.

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