vector signal generator/arbitrary waveform

This forecast from the Department of Commerce Office of the Director focuses on the procurement of vector signal generators and arbitrary waveform equipment to enhance plasma etching within semiconductor manufacturing. The project aims to address the nonlinear complexities of RF waveforms and plasma chemistry by developing advanced RF waveform metrology and microsecond time-resolved frequency comb diagnostics. These tools are intended to improve RF calibration, enable in-situ monitoring, and provide real-time data to optimize the design of next-generation etching processes. The work will be performed in Boulder, Colorado, under NAICS code 334413. Interested parties can coordinate through the designated point of contact, Nathali Medina, to support the goal of better correlating reactor inputs with etching outcomes and ensuring consistency across manufacturing tools.