A -- PHOTOMASK INFRASTRUCTURE PROGRAM FOR FUTURE GENERATION MASK PATTERNING TOOLS

NOTICE OF INTENT TO AWARD A SOLE SOURCE PROCUREMENT FOR PHOTOMASK INFRASTRUCTURE PROGRAM FOR FUTURE GENERATION MASK PATTERNING TOOLS. This is a pre-solicitation synopsis which is not a request for competitive proposals. The work will identify, analyze and evaluate enabling technologies for future generations of mask patterning tools. The Air Force Research Laboratory, Manufacturing Technology Division (AFRL/MLM) intends to award a contract (with 50/50 cost share) or a Technology Investment Agreement (with 50/50 cost share) as appropriate, on the basis of less than full and open competition for this requirement to Applied Materials, Inc., 3050 Bowers Avenue, Santa Clara, CA 95054. Under the authority of Title III of the Defense Production Act (DPA) (50 U.S.C. App. Section 2061 et seq.), the Title III Program Office is contemplating this procurement to maintain a U.S. owned domestic merchant photomask pattern tool manufacturer in order to meet the future defense requirements for critical integrated circuits (classified applications). Note: If subsequent phases are awarded, the offeror must be able to satisfy the requirements of classified programs. The period of performance for the procurement is anticipated to be 12 months. A description of the task is as follows: Mask Patterning Tool Technical Analysis and Study for feature size 45nm node and below. The ability of the offeror to conduct this technical analysis and study and accomplish the goals of this program will be assessed based on the offeror's demonstrated leadership in the industry and the offeror's capability to effectively address challenges facing future generations of mask patterning tools. These challenges include (a) optimization of Critical Dimension Uniformity (CDU) for electron-beam based mask-patterning tools while simultaneously providing higher figure rates than Vector Scanned Beam (VSB) architectures and (b) the identification and demonstration of the critical technologies required for such electron-beam lithography. The government intends to issue an award for these requirements on a Sole Source basis per FAR 6.302-1(a)(1), - Only One Responsible Source or - DoD Grant and Agreement Regulations 37.400 (b), based on their domestic R&D activity and on their experience as a merchant industrial supplier providing leading edge technology, as well as an assessment of the program risk to the Government. Offerors who are capable of providing the services stated above shall fully identify their interest and submit, in writing, information documenting their qualifications and capabilities to meet the requirements stated above within 15 days after publication of this synopsis. This documentation shall specify the offeror's area of expertise and experience. It shall include the photomask feature size currently supported as an industrial supplier. The documentation shall include a listing of products and services currently offered as a merchant industrial supplier along with market share in each area. The documentation shall identify relevant past, present and future research along with information on research budgets, personnel, and facilities. The information should identify the feature size currently under R&D and the time table for migrating to successive smaller feature sizes. The offeror shall document their experience in transitioning the product from R&D to production. Responses received after 15 days or without the required information will be considered non-responsive to the synopsis, and will not be considered. Direct all technical questions pertaining to this acquisition to Capt Mitchell Fait, Project Engineer, at Mitchell.Fait@wpafb.af.mil. Note: In addition, direct all questions pertaining to this acquisition to the contracting point of contacts listed above in this announcement. Only one responsible source per capability of interest and no other supplies or services will satisfy agency requirements as per the authority under 10 U.S.C. 2304(c)(1). All responsible sources may submit information, which shall be considered by the agency. See Numbered Note 22.