Benchtop Low-Pressure RF Plasma Etch Instrument Supply

The contract involves the supply and delivery of a PE200 benchtop plasma etch instrument designed for low-pressure RF plasma treatment, specifically to support high-throughput production of 3D tissue models. This equipment is essential for precise surface modification and cleaning processes critical in biomedical research environments where reproducible and scalable tissue engineering workflows are required. The instrument must meet technical specifications for consistent plasma performance at reduced pressures to ensure compatibility with delicate biological substrates and to enable efficient, repeatable surface treatments across large batches. The opportunity is classified as a subcontract under NAICS code 333318 and is issued by the National Institutes of Health under the Department of Health and Human Services. The solicitation was posted on June 30, 2026, with a firm deadline for responses on July 22, 2026, at 4:00 PM. While no specific place of performance or point of contact is provided, the instrument is expected to be delivered to a location aligned with NIH research facilities conducting advanced tissue modeling. The procurement does not indicate a set-aside classification, suggesting it is open to all qualified vendors capable of delivering the specified technology under the required timelines and performance standards.