D -- UPGRADE OF AXIC REACTIVE ION ETCHER WITH PLASMOPS SOFTWARE
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The U.S. Department of Commerce’s National Institute of Standards and Technology (NIST), specifically the Quantum Electrical Metrology Division (QEM), intends to upgrade an Axic Reactive Ion Etcher by installing PlasmOps Software through a sole source contract with AGS Plasma Systems, Inc. This upgrade will ensure compatibility with other reactive ion etchers on-site and is required to take no more than 10 days of downtime. Key requirements include replacing the computer control system with minimal modifications while replicating all existing operational modes and recipe handling; the upgrade will be executed within QEM's clean room facility in Boulder, Colorado. The new interface and control software must mirror the QEM's existing I.P.E. Reactive Ion Etcher system, run on a standard Windows PC, and utilize Microsoft’s Visual Basic programming language. This procurement is being conducted under the simplified acquisition procedures, with a ceiling of $100,000, and is justified by market research identifying AGS Plasma Systems as the sole capable provider able to meet the timeframe and technical requirements. No competitive solicitation is planned, although responses will be reviewed only to assess the necessity of competitive procedures. Interested contractors must be registered with the Central Contractor Registry. The contract anticipates award by early August 2004, and all inquiries should be directed in writing to the purchasing agent, Kelly A. Rima. This effort supports continuity and efficiency in managing NIST’s specialized reactive ion etching equipment through a precise, software-driven upgrade.
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