This Government Contract opportunity from Department Of Commerce was posted on August 9, 2023. The submission period has ended. Browse the details below for market research, or find similar active opportunities.
HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System
Contract Overview
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The Department of Commerce National Institute of Standards and Technology issued an award notice for the procurement of an HBr-Cl-based ICP Silicon Etch System and a DRIE-based ICP Silicon Etch System under solicitation number NB680000-23-00677. This action involves a sole-source, non-competitive procurement from Plasma-Therm LLC for two commercial inductively coupled plasma etch systems, which include four-year warranties. The procurement is conducted under the authority of 41 U.S.C. 3304(a)(1) following market research and public notices that indicated only one source could meet the minimum technical specifications. The contract is managed by the NIST office located in Gaithersburg, Maryland, where the systems will also be performed. Classified under NAICS code 333242, the acquisition process included a justification for other than full and open competition to ensure the specific technical requirements were met. The contracting officer is responsible for determining the fairness and reasonableness of the price prior to the final award.
General Info
Contract Value
$1,076,690Place of Performance
Gaithersburg, MD, 20899, USASet-Aside
Awardee
PLASMA-THERM LLCAward Issued Date
Documents
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Timeline
Submission Closed
Organization & Contact Information
Full Description
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