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This Combined Synopsis/Solicitation opportunity from Department Of Defense was posted on February 28, 2020. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Nanoscale spectroscopic IR-AFM-NSOM sy stem

Closed
PANAPG20P4398Federal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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NAICS: 541713
SBIR / STTR
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Solicitation # OSW26TZ06-NV005
Solicitation OSW26TZ06-NV005, issued by the Office of the Secretary of Defense, seeks the development of ultrafast, high-endurance, nonvolatile memory technology utilizing sliding ferroelectricity in polar moiré van der Waals homostructures. The objective is to create memory devices that outperform current technologies in speed, endurance, and scalability by leveraging engineered nanoscale polar domains. The project aims for dual-use applications, specifically targeting edge computing, neuromorphic computing, and radiation-tolerant electronics. Performance will be measured by switching speed, switching energy, endurance, retention, readout fidelity, and device-to-device reproducibility. This is a total small business set-aside under the SBIR/STTR mandate for companies with fewer than 500 employees. The contract is structured in phases, with a Phase II base period of 10 to 12 months not to exceed 1,000,000 dollars, and an optional period of 10 to 12 months for an additional 1,000,000 dollars. Awardees may also request up to 50,000 dollars in Discretionary Technical and Business Assistance. Proposals must be submitted via the Defense SBIR/STTR Innovation Portal by October 21, 2026, and will be evaluated based on technical merit, innovation, investigator qualifications, and commercialization potential. Compliance with CMMC and DFARS cybersecurity standards is required to safeguard federal contract information.
Office of the Secretary of Defense

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NAICS: 541713
SBIR / STTR
Engineered Microstructures for Enhanced IR Aperture Performance
Solicitation # OSW26BZ06-NV024
The Office of the Secretary of Defense, through the Office of the Secretary of War, is soliciting proposals under the Small Business Innovation Research program for the development of engineered microstructures to enhance infrared aperture performance. The project seeks innovative powder synthesis and consolidation methods to produce IR-transparent composite ceramics at a scale exceeding 2 by 4 by 0.5 inches, with a long-term goal of producing components in the 3 by 9 inch range or larger. To be suitable for transition, the material must achieve sub-100 nm microstructural features in all phases, porosity below 0.1 percent, and Short-Wave to Mid-Wave Infrared transparency of at least 80 percent. Additionally, the composite must maintain these properties after exposure to 1200 degrees Celsius for 10 minutes and meet a thermal expansion to thermal conductivity ratio of 1.0 micrometers per Watt or less at 1000 degrees Celsius, with a target of 0.5 micrometers per Watt. This solicitation, numbered OSW26BZ06-NV024, is set aside for Small Business Concerns and offers a Phase I base value of 300,000 dollars over a 12-month period of performance, with potential additional TABA funding up to 6,500 dollars. Proposals must be submitted via the Defense SBIR STTR Innovation Portal by October 21, 2026, and must include seven specific volumes covering technical, cost, commercialization, and disclosure data. Awardees are required to maintain active registrations in SAM and the SBA Company Registry and must comply with DFARS 252.204-7012 for safeguarding covered defense information. The government will evaluate the work based on high professional standards, utilizing X-ray diffraction and scanning electron microscopy with energy dispersive spectroscopy to verify technical specifications.
Office of the Secretary of Defense

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about 2 months ago

DEADLINE

in about 3 hours
NAICS: 541713
SBIR / STTR
Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER)
Solicitation # DPA26TZ06-DV004
The Scalable Hard-mask materials with Improved Etch resistance and Low Degradation for Extreme-aspect-Ratio fabrication (SHIELDER) project is a Small Business Technology Transfer (STTR) solicitation issued by the Defense Advanced Research Projects Agency (DARPA). The objective is to develop innovative nanofabrication hard-mask materials that overcome the physical limitations of current state-of-the-art inorganic films and sputtered metals. The goal is to enable the creation of extreme high-aspect-ratio structures, specifically targeting a 100:1 ratio, with minimal sidewall roughness and precise dimensional control. These materials are intended for use across various platforms, including semiconductor, photonic, MEMS, and quantum devices, and should be compatible with standard plasma fabrication tools such as RIE, ICP, and Bosch Deep RIE. This total small business set-aside opportunity offers a primary award value of 1,500,000 dollars over a 24-month period of performance, with an additional 12-month option valued at 450,000 dollars. Proposers may also be eligible for TABA funding of up to 6,500 dollars in Phase I and 50,000 dollars in Phase II. Proposals will be evaluated on their own individual merit based on technical merit, investigator qualifications, and commercial potential. Submissions must be made via the Defense Solutions Innovation Portal by October 21, 2026. Awardees must adhere to strict security requirements, including CMMC Level 2 self-assessment certification for those handling controlled unclassified information or ITAR-regulated work.
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about 2 months ago

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NAICS: 541713
SBIR / STTR
Monolithic Graphene–CMOS Broadband (UV-LWIR) Focal Plane Arrays for target detection in low-light conditions
Solicitation # OSW26BZ06-DV027
Solicitation OSW26BZ06-DV027 is a Small Business Innovation Research (SBIR) effort issued by the Office of the Secretary of Defense to develop a wafer-scale, monolithically integrated graphene-on-CMOS image sensor. The project aims to create a compact, low-power, uncooled focal plane array capable of broadband imaging from 300 nm to 10,000 nm (UV-LWIR) to enhance naval ISR target detection in low-light conditions. The primary technical objective is to retire risks associated with graphene material quality, high-yield back-end-of-line transfer, and absorber sensitization, with a specific performance goal of increasing integrated-device carrier mobility to approximately 10,000 cm²/V·s. This Direct to Phase II award has an estimated value of 2,000,000 dollars with a base period of performance of 24 months. Proposals will be evaluated based on technical approach, qualifications of key personnel, and commercial potential, with the contract likely taking the form of a Firm-Fixed-Price or Cost-Plus-Fixed-Fee agreement. Awardees must comply with strict cybersecurity and data safeguarding requirements, including R-DFARS 252.204-7012 and CMMC Phase I self-assessment standards. Submissions must be made via the DSIP portal and include comprehensive technical, cost, and commercialization volumes.
Office of the Secretary of Defense

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about 2 months ago

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NAICS: 541713
SBIR / STTR
Scalable Processing of Large Area, Oriented 2-Dimensional Polymer Films
Solicitation # OSW26TZ06-NV007
Solicitation OSW26TZ06-NV007, issued by the Office of the Secretary of Defense, seeks a scalable and cost-effective method to produce large-area, oriented 2-dimensional polymer (2DP) ensemble films, such as covalent organic frameworks. The primary objective is to overcome current processing limitations that result in insoluble powders or mechanically weak films by developing a process amenable to roll-to-roll manufacturing. The goal is to achieve high structural order and orientation of individual sheets perpendicular to the film plane while minimizing defects like pinholes and stacking errors. The project is structured in three phases: Phase I requires a continuous process producing films 1-50 microns thick at a rate of 100 feet per minute; Phase II aims to increase deposition rates by 2-5 times; and Phase III focuses on scaling to manufacturing-relevant levels with highly aligned domains. This is a Total Small Business Set-Aside under the STTR program, requiring proposing firms to be registered in SAM and the SBA Company Registry. Proposals must be submitted via the Defense SBIR/STTR Innovation Portal by October 21, 2026. Evaluation is based on technical merit, innovation, personnel qualifications, and commercialization potential, with technical soundness being the most important factor. Awardees must comply with strict cybersecurity standards, including CMMC and NIST SP 800-171/172, and provide an intellectual property agreement between the small business and its research partner. All work is expected to be performed at the unclassified level and is subject to government inspection to ensure high professional standards.
Office of the Secretary of Defense

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about 2 months ago

DEADLINE

in about 3 hours

General Info

NAICS

541713 - Research and Development in Nanotechnology

Place of Performance

MA, USA

Set-Aside

SBA

Documents

0

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Timeline

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PhaseClosed
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Combined Synopsis

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Response Deadline

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Submission Closed

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Organization & Contact Information

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AgencyDepartment Of Defense → W6QK Acc-Apg Natick
Contacts2 people available
OfficeNATICK, MA, 01760-5011, USA
Office AddressNATICK, MA, 01760-5011, USA

Full Description

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Requirements Document: Nanoscale IR spectroscopic-AFM-s-SNOM capability Background: A novel capability for nanoscale broadband infrared (IR) spectroscopy (NBIS) with Atomic Force Microscopy (AFM) and apertureless Scanning Near-field Optical Microscopy (s-SNOM) is needed to better understand and control smart materials that impact signature management, multi-functionality, and thermal management. These areas are critical for future Soldier needs and under increasing emphasis at CCDC-Soldier Center. In addition, there are no or poorly written requirements for these areas, which may result in wasted acquisition dollars spent because S&T and PM personnel don't understand well enough proposed new capabilities in the infrared regime and especially in the new areas of smart materials and e-textiles. This capability would give critical understanding and control of nano-infrared capabilities to the acquisition and technical workforce. Traditional Fourier Transform InfraRed (FTIR) Spectroscopy FTIR involves the use of a broadband light source to illuminate a sample, with use of an interferometer to very accurately measure the different frequency (Fourier) components of the broadband infrared signal. Recently, based on exciting research results from academia, companies have begun to develop technology for measuring the infrared response of very small nanoscale regions on surfaces, which is important for understanding how material properties influence infrared functionality and properties. - AFM-IR is a new technique where a sample is illuminated by a tunable broadband infrared laser, which excites the sample's absorption resonances that occur at wavelengths within the laser excitation wavelength range. These infrared excitations heat the sample more efficiently than other wavelengths, and this manifests itself as an increased AFM signal at these resonant wavelengths, identifying them by their heightened response. Hence, this - AFM-IR is a new nanoscale IR spectroscopic technique. - s-SNOM is also a nanoscale IR spectroscopic technique, where apertureless SNOM measures the scattered and/or absorbed and/or reflected near-field light created by infrared excitation as a function of IR wavelength, to better understand important infrared functionalities and properties. Requirements: The Nanoscale IR spectroscopic-AFM-s-SNOM capability system must have: 1) Broadband infrared laser source to illuminate the sample, with wavelength range from 2.5 mm to 15 mm wavelength (670 to 4000cm-1), especially the important 800 cm-1 to 1850 cm-1 (5.4 to 12.5 mm) sub-range. By extending the source's range past 14 mm and below 5 mm, it will be possible to excite certain polymer and nanostructure absorption and scattering resonances that are of interest. The broadband infrared laser source must have both pulsed and continuous wave (cw) modes and enough power to heat the sample locally and enable both AFM measurement of thermal absorption resonances (in pulsed mode) and s-SNOM optical measurement of absorption and/or reflection and/or scattering resonances. Both these measurement techniques must be possible to carry out from the same overall system. E.g., it is impractical to make these measurements using two separate sources and setups. Tunability of the broadband source is desired in the wavelength region for the AFM spectroscopy (AFM-IR). Note that modulation of visible light via a - photothermal effect is not a desired technique. 2) Associated basic and advanced training to enhance understanding of smart materials and their analysis by acquisition personnel. Advanced training will be conducted after users have basic training and have time to use the system's capability. There should be at least 2 or 3 days of initial installation and training, followed by a total of at least four days training to be scheduled later, upon return of the contractor to the government site at a mutually agreeable date. These four days should be split up into at least 2 different non-continuous sessions, in order to enable acquisition personnel to learn more about using this advanced capability on their own time, before the contractors return to provide more specialized training. 3) AFM capability for nanoscale imaging and spectroscopy (AFM-IR), including tapping mode, to measure thermal absorption resonances. The tapping or contact AFM response changes due to mechanical deformation from thermal expansion (or contraction) from resonant infrared (heat) absorption from the broadband infrared laser. The change in the AFM response should be measured using an a.c. technique, a pulsed broadband laser with tuned output in a wide, 670 to 2000 cm-1 (5 to 15 mm wavelength) range, and with the AFM in tapping mode. In the future, it is desirable to increase tunability to 4000 cm-1 (2.5 mm wavelength), in order to characterize important chemical resonances around 3 mm wavelength. 4) Apertureless s-SNOM optical capability for measurement of absorption and/or reflectivity and/or scattering resonances near the scanning AFM head, illuminating with a broadband IR laser source, in continuous wave (cw) mode, in the range of at least 670 cm-1 to 2000 cm-1 (5 to 15 mm). s-SNOM spectroscopic measurements to 4000 cm-1 (2.5 mm) are desirable. 5) Appropriate electronic control including possible computer(s) with software for controlling the system. Shipping Address: 10 General Greene Avenue Warehouse 20 Attn: Richard Osgood Natick, MA 01760

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NAICS: 315120
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