This Government Contract opportunity from Department Of Defense was posted on August 29, 2025. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

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Photoresist Direct Write Lithography System

Awarded

N0017325Q0006Federal

Submission Closed08/29/2025, 12:00:00 PM UTC

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

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NAICS: 333242

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Solicitation # Doc2441528264

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Manufacturing of Oil Coolers (NSN 2520014538881)This subcontract involves the manufacturing of 17 oil coolers for prime contractors supporting the Department of Defense, specifically under the DLA Weapons Support Land Supplier Operations for wheeled vehicles. The contractor is required to fabricate the units according to NSN 2520014538881 specifications and must adhere to RA001 technical and quality requirements. Production may be carried out using industrial fabrication equipment or approved additive manufacturing processes. Compliance with the Buy American Act and the DLA Master List of Technical and Quality Requirements is mandatory for this project. The work is associated with NAICS code 333242 and is to be performed in New Cumberland. Interested parties must respond by October 23, 2026.

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POSTED

8 days ago

DEADLINE

in 3 days

AI Contract Overview

The Naval Research Laboratory, under the Department of Defense, has awarded a firm-fixed-price contract to Raith America Inc. for the procurement of a Photoresist Direct Write Lithography System. This acquisition was conducted as a total small business set-aside under the guidelines for commercial items. The system is required to meet rigorous technical specifications, including support for 375nm and 405nm light sources, compatibility with Windows 10 and various CAD file formats such as GDS-II, and the ability to achieve critical dimensions of 300nm. The contract also mandates a 12-month warranty and comprehensive training for the facility. The system must be delivered to the Naval Research Laboratory in Washington, DC, by September 29, 2026. Key administrative details include payment processing through the Wide Area Workflow system and specific maintenance requirements, such as factory-level refurbishment for replacement laser diodes. The procurement process involved a detailed request for quote and subsequent amendments to clarify technical requirements and pricing schedules for the system and its associated shipping.

General Info

Agency

Department Of Defense → Naval Research Laboratory

Contract Value

$485,800

NAICS

333242 - Semiconductor Machinery Manufacturing

Place of Performance

DC, USA

Set-Aside

SBA

Awardee

RAITH AMERICA INC

Award Issued Date

08/29/2025, 12:00:00 AM UTC

Documents

N0017325Q0006 Amendment 0001 - Photoresist Direct Write Lithography System

amendment

High

N0017325Q0006 - Photoresist Direct Write Lithography System

rfq

High

Specifications for Photoresist Direct Write Lithography System (Updated 30 May 2025)

specifications

High

N0017325Q0006 Questions and Answers

q-and-a

Low

AI Contract Breakdown

Uniform Contract Format

Contract not broken down yet

CLEATUS splits the solicitation into Uniform Contract Format (UCF) sections: scope, pricing, deliverables, and evaluation criteria.

Timeline

1 update

PhaseAwarded

PostedJun 3

Combined Synopsis

Notice updatedJun 25

The notice description changed.

AwardedAug 29

Contract was awarded

Submission Closed

08/29/2025, 12:00:00 PM UTC

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Organization & Contact Information

AgencyDepartment Of Defense → Naval Research Laboratory

Contacts2 people available

OfficeWASHINGTON, DC, 20375-5328, USA

Organization / AgencyDepartment Of Defense → Naval Research Laboratory

Office AddressWASHINGTON, DC, 20375-5328, USA

Contacts

Tamara Jenkins

contact@example.gov

+1 (555) 000-0000

Arthur Rego

contact@example.gov

Full Description

This contract is awarded to Raith America Inc. as a total small business set-aside (FAR 19.5), under purchases of Commercial Items IAW FAR part 12 and 13.5 for the procurement of Photoresist Direct Write Lithography System (PWDL).