RECOVERY-Epitaxial Materials Deposition for Systems Qubits

RECOVERY - INFORMATION RECEIVED SHALL BE USED FOR MARKET RESEARCH PURPOSES ONLY. THIS PROCUREMENT WILL UTILIZE THE AMERICAN RECOVERY AND REINVESTMENT ACT (ARRA) OF 2009 FUNDING. All responsible sources are encouraged to respond to this notice; however, sources that do not respond shall not be precluded from responding to any subsequent solicitation. Responses from responsible sources should clearly establish the capability of the Epitaxial Materials Deposition for Systems Qubits. After results of this market research are obtained and analyzed, NIST may conduct a competitive procurement and subsequently award a Purchase Order. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that results would be conducted as a small business set-aside. NIST requires a Suite of materials deposition equipment consisting of three separate vacuum systems to produce microelectronic devices in the new clean room facility being constructed at the NIST in Boulder, CO. These multi-user deposition systems will be shared amongst several NIST Laboratories and Divisions. These varied user groups conduct research in the fields of Superconductivity, Magnetics and Optical Coatings. The deposition systems will provide several different techniques for the deposition of metal and insulating thin films critical to research projects at NIST. The Suite of systems will accommodate silicon and insulating wafers of 76.2 mm, 100mm and 150mm diameters. NIST is seeking to procure the components described herein as an integrated system from a single vendor. In this scenario, the awardee would be responsible for manufacturing/procuring the required components, integrating the components as required, delivering the intergraded system along with any installation, training, or warranty services that is defined in the contemplated contract. Please include specific comments in your response as the whether or not your company can deliver such an integrated systems. The Suite of Thin Film Materials Deposition Systems consists of three separate vacuum systems as follows: I) Electron Beam Evaporation System (E-Beam) II) Magnetron Sputter Deposition System III) Multi-Tool System including Sputter Deposition Sources, an E-Beam Source, a Thermal Evaporation Source, and an Ion Beam Source. Suite Specifications Special Installation Requirements for Systems I, II, and III: The new clean room facility for system installation is not expected to be completed until the first quarter of 2011. As a result, the awardee may choose to provide means of safely storing the systems prior to installation at our facility. The system shall be provided with suitable transportation and installation support. The system shall be provided with suitable documentation to prepare the site for installation. System I: Electron Beam Deposition system described here will be a general purpose thin film metal deposition tool in the Quantum Fabrication Facility at NIST. This system will be used for the development of superconducting devices, MEMS devices and magnetic devices. The vacuum system must have a six pocket electron gun to hold materials for evaporation, and also have a load lock for rapid wafer interchange. The system must provide for computer automation of deposition steps using a recipe system System II: Magnetron Sputter Deposition system described here will contain three magnetron sputter sources that will be used for the development of superconducting, magnetic and optical devices. The system should be a sputter-up configuration with sources in a con-focal arrangement. The system shall include a load-lock chamber and will have substrate surface cleaning capabilities on a rotating; water cooled main chamber sample stage. The load-lock must be configured to allow controlled oxygen dosing. The system must provide for computer automation of deposition steps using a recipe system. System III: Multi-Tool Deposition System described here will be used for the development of precision quantum computing devices that utilize pure superconducting thin films and tunnel junctions. The Multi-tool system shall contain three sputter magnetron sources, a 3 pocket Electron Beam evaporation, one effusion cell evaporator and Ion Beam Assisted Deposition (IBAD) source. The effusion cell should be operable in a pressure of 1x10-4 Pa of oxygen. The system must be capable of maintaining a minimum of 800 ?C substrate temperatures (1000 C preferred) during deposition for at least one sputter source. The system should be a sputter-up configuration with sources in a con-focal arrangement. Additionally the system should include substrate surface cleaning capabilities and a load-lock chamber. The load-lock must be configured to allow controlled oxygen dosing. The system must provide for computer automation of deposition steps using a recipe system. NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 333295, as those domestic sources having 500 employees or less. Please include your company's size classification in any response to this notice. Requested Information to be Included in Response to this Notice: 1. Indicate whether your company manufactures or is an authorized reseller/business partner for a System as described, and, if so, please provide completed commercial specifications for the System that your company manufactures or sells, including the name of the company that manufactures, reconditions, or remanufactures the SYSTEM, where it is manufactured, and detailed functional and performance specifications that the product meets. 2. If your organization is an original equipment manufacturer of SYSTEM, then please provide the name of the company(ies) that are authorized by your organization, as the OEM, to sell your organization's chambers, as well as their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Describe optional items that are available for purchase for the SYSTEM, such as consumables, spares, tools, additional components, ancillary equipment, software licenses, telephone support, etc. 4. Provide past examples of major scientific instruments or apparatus your company has integrated into a SYSTEM. 5. If any of the above referenced NIST SYSTEM specifications appear to be unduly restrictive, then please indicate which specification you believe is unduly restrictive and indicate how you believe it could be more competitively worded such that it can be met by more than one SYSTEM manufacturer and still meet the definition of commercial item at FAR 2.101. 6. Indicate whether modifications of the SYSTEM currently manufactured or sold by your organization would be necessary to meet Government specifications listed in this notice and, if so, indicate whether those modifications would be considered minor modifications as described in the FAR Subpart 2.101 definition of commercial item. 7. The number of persons currently employed by your company, including parent organization and all subsidiaries (if applicable). 8. Indicate whether the SYSTEM referenced in the response is currently available for ordering form one or more GSA Federal Supply Schedule (FSS) contracts and, if so, provide the GSA FSS contract number(s). 9. Provide any other relevant that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research. Responses to this notice shall be sent by email to Barbara Brunstetter, Contract Specialist Support, at barbara.brunstetter@nist.gov, with cc: to Todd Hill at todd.hill@nist.gov, so that it is received at that email address no later than March 18, 2010. The responses should include responses to the questions listed above.