RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching

This contract, issued by the Department of Commerce under the AD for Laboratory Programs, seeks scientific services to support fundamental metrology research for the CHIPS R&D Metrology program. Specifically, the project focuses on the development and operation of advanced optical diagnostics for plasma etching processes, titled RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching. The work will be performed in Gaithersburg, Maryland, and is designated as a total small business set-aside under NAICS code 541690. The selected contractor will be responsible for a wide range of technical tasks, including the assembly and operation of plasma etch chambers and the implementation of in situ optical diagnostics. Key technical requirements involve temporally and spatially resolved optical emission spectroscopy, mid-infrared laser absorption spectroscopy, and Langmuir probe measurements. Additionally, the contractor must handle data processing, correlate diagnostic results with RF waveform measurements, support model validation, and prepare technical materials for NIST review and dissemination.