Operando Measurements for Electrochemical Surfactant-Mediated Growth Mechanisms for Interconnect Materials

This contract seeks technical research support for the Department of Commerce to conduct operando electrochemical measurements focused on surfactant-mediated metal deposition processes. The primary objective is to support NIST research into the mechanisms of electrochemical deposition for copper and alternative interconnect metals, such as rhodium and iridium, specifically investigating nucleation and growth processes. A key area of focus involves analyzing how co-adsorption and competitive adsorption of additives, suppressors, surfactants, halides, anions, and cations influence metal deposition and interfacial structure. This initiative is part of the CHIPS Act project titled Electrodeposition of Interconnect Materials and Packaging and will be performed in Gaithersburg, Maryland. The opportunity is designated as a total small business set-aside under NAICS code 541713. Interested parties can coordinate through the point of contact, William Clark, regarding this forecast for laboratory program support.