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This Government Contract opportunity from Department Of Energy was posted on May 15, 2026. The submission period has ended. Browse the details below for market research, or find similar active opportunities.

Supply of Critical Components for ICP Etching System

Closed
Federal

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The contract involves the supply of high-precision subsystems essential for the ICP etching system, including RF generators, mass flow controllers, gas manifolds, turbomolecular pumps, and process control hardware. These components play a critical role in the functionality and performance of the etching system, ensuring precise control and reliability during operation. The contract is issued as a subcontract under the NAICS code 334516, which pertains to manufacturing components for electronic and electrical equipment. The solicitation was posted on May 15, 2026, with a response deadline of May 26, 2026. The contract is managed by the Argonne National Laboratory, operating as a contractor for the Department of Energy, and the work will be performed in the 60439 zip code area. While specific details on the office address and point of contact were not provided, the contract emphasizes timely procurement and integration of these critical components to support advanced research and development efforts at the facility.

General Info

Subcontract for supplying ICP etching system components, managed by Argonne National Laboratory, deadline May 26, 2026.

Agency

Department Of Energy → Argonne National Labor - DOE Contractor

NAICS

334516 - Analytical Laboratory Instrument Manufacturing View NAICS

Place of Performance

IL, 60439, USA

Set-Aside

NONE

Documents

(0)

No documents available

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Timeline

PhaseClosed
Posted

subcontract

Response Deadline

Deadline has passed

Submission Closed

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Organization & Contact Information

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AgencyDepartment Of Energy → Argonne National Labor - DOE Contractor
ContactsNo contacts available
OfficeN/A
Organization / Agency
Department Of Energy → Argonne National Labor - DOE Contractor
Office AddressN/A
ContactsNo contact information available

Full Description

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Supply high-precision subsystems including RF generators, mass flow controllers, gas manifolds, turbomolecular pumps, and process control hardware for integration into the ICP etching system.