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59 -- INDUCTIVELY COUPLED PLASMA SOURCE

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NB8170713753KARFederal

Contract Overview

Solicitation details, issuing organization, response deadlines, documents, and interested companies for this government contract opportunity.

AI Contract Overview

The U.S. Department of Commerce's National Institute of Standards & Technology (NIST) intends to award a sole source contract to Trion Technology for an inductively coupled plasma (ICP) source unit designed to enhance the capabilities of a recently acquired Minilock-Phantom III reactive ion etching (RIE) system. This RIE system is a compact, vacuum load-locked device used in research and failure analysis labs to perform plasma etching on single wafers, dies, or parts up to 200mm in size. The load-lock feature improves user safety by preventing direct contact with the process chamber and residual etch materials while maintaining the chamber under vacuum to prevent moisture and corrosion. Integrating the ICP source will significantly improve etch rates, profile control, uniformity, selectivity, and reduce radiation damage and contamination associated with RIE sputtering, benefiting materials such as oxides, III-V semiconductors, polyimide, polysilicon, and radiation-sensitive active devices. This procurement will follow simplified acquisition procedures under the Federal Acquisition Regulation (FAR) Part 13.1 since the value is under $100,000. A sole source contract is justified because Trion Technology is already assembling the Minilock-Phantom III system, and using ICP source units from other vendors would void the equipment warranty and is incompatible with the system’s proprietary computer controls and software. Though the notice serves informational purposes and does not anticipate competitive bidding, responses addressing the qualifications related to this requirement will be considered to determine if competitive competition would serve the Government’s interests. Technical inquiries must be submitted in writing before June 15, 2007, with an anticipated contract award date of June 18, 2007. The contracting office is located in Seattle, WA, with Kelly A Rima as the point of contact.

General Info

NIST awards sole source contract to Trion for ICP source enhancing Minilock-Phantom III RIE system.

Agency

Department Of Commerce Noaa

NAICS

334413 - Semiconductor and Related Device Manufacturing

Place of Performance

Set-Aside

NONE

Documents

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Timeline

PostedMay 31

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Organization & Contact Information

AgencyDepartment Of Commerce Noaa

Contacts1 person available

OfficeSEATTLE, WA, 98115, USA

Organization / AgencyDepartment Of Commerce Noaa

Office AddressSEATTLE, WA, 98115, USA

Contacts

Kelly A RimaPurchasing Agent

contact@example.gov

+1 (555) 000-0000

Full Description

The U.S. Department of Commerce, National Institute of Standards & Technology (NIST) proposes to negotiate on a sole source basis contract under the authority of 41 U.S.C. 253(c)(1) with Trion Technology for an inductively coupled plasma (ICP) source unit that will enhance the use of a recently purchased reactive ion etching (RIE) system (Minilock-Phantom III). The compact, vacuum load-locked reactive ion etcher (RIE) is designed to supply research and failure analysis labs with state-of-the-art plasma etch capability using single wafers (up to 200mm), dies or parts. Samples are loaded into the process chamber via the vacuum load-lock. This feature increases user safety by preventing contact with the process chamber and any residual etch by-products. The load-lock also allows the chamber to remain permanently under vacuum thereby keeping out moisture and keeping the reaction chamber free of possible corrosion. The ICP source will result in improved etch rates and profile control, improved uniformity, greatly increased selectivity and a dramatic reduction in radiation damage and contamination from RIE sputtering. Some applications benefiting from this technology are oxide, III-V materials, polyimide, polysilicon and active devices which are affected by radiation.This procurement is being conducted per FAR Part 13.1, Simplified Acquisition Procedures (under $100K). This notice is for information purposes only. No competitive solicitation is planned. Trion Technology is currently assembling our Minilock-Phantom III RIE system and the use of another vendor ICP source unit would make the warranty void on the RIE system. Trion's computer control and software for the Minilock-Phantom III is also incompatible with ICP source units from other vendors. Information submitted in response to this notice will be used solely to determine whether or not use of competitive procedures to fulfill this requirement would be in the Government's best interest and must address qualifications pertinent to this requirement. All technical questions must be submitted in writing to the Contracting Officer by e-mail before June 15, 2007. Anticipated award date will be June 18, 2007.